SCHEMBL648317

SCHEMBL648317

FC(F)C(F)(COCC(F)(C(F)F)C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30674438 0.78
SCHEMBL5881283 0.71
SCHEMBL30259668 0.69
SCHEMBL648441 0.69 MAPT (0.39)
SCHEMBL7751359 0.67
SCHEMBL6573296 0.67
SCHEMBL6408879 0.67
SCHEMBL9172188 0.67
SCHEMBL11897246 0.65 MAPT (0.34)
SCHEMBL2003079 0.65 LMNA (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112490015-A Asymmetric high-voltage super capacitor 西安合容新能源科技有限公司 2021-03-12 CN claimed
US-12528894-B2 Fluororesin, fluororesin particles, and methods for producing these TOSOH CORPORATION (JP) 2026-01-20 US disclosed
US-12522679-B2 Method for producing fluororesin TOSOH CORPORATION (JP) 2026-01-13 US disclosed
EP-4129992-B1 FLUORINE RESIN AND METHOD FOR PRODUCING SAME TOSOH CORP (JP) 2025-11-19 EP disclosed
US-12398223-B2 Method for producing fluororesin particles TOSOH CORPORATION (JP) 2025-08-26 US disclosed
US-12325769-B2 Fluororesin, fluororesin particles, and methods for producing these TOSOH CORPORATION (JP) 2025-06-10 US disclosed
US-12147012-B2 Optical element and method for manufacturing the same PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2024-11-19 US disclosed
US-20240158551-A1 FLUORORESIN TOSOH CORPORATION (JP) 2024-05-16 US disclosed
US-20240141081-A1 FLUORORESIN, AND METHOD FOR PRODUCING SAME TOSOH CORPORATION (JP) 2024-05-02 US disclosed
US-20240076426-A1 FLUORORESIN, FLUORORESIN PARTICLES, AND METHODS FOR PRODUCING THESE TOSOH CORPORATION (JP) 2024-03-07 US disclosed
EP-3865521-A1 FLUORORESIN, METHOD FOR PRODUCING SAME, AND METHOD FOR PRODUCING FLUORORESIN PARTICLES Tosoh Corporation (JP) 2021-08-18 EP disclosed
EP-3858873-A1 FLUORORESIN, FLUORORESIN PARTICLES, AND METHODS FOR PRODUCING THESE Tosoh Corporation (JP) 2021-08-04 EP disclosed
CN-113024794-A Composition capable of reacting with isocyanate and polyurethane material prepared from same 红宝丽集团股份有限公司 2021-06-25 CN disclosed
CN-111471210-A Polyurethane composition of pentane co-foaming system and preparation method of polyurethane rigid foam 南京红宝丽聚氨酯有限公司 2020-07-31 CN disclosed
US-8236923-B2 Fluorine-containing polymer and method of producing fluorine-containing polymer FUJIFILM CORPORATION (JP) 2012-08-07 US disclosed
US-8119765-B2 curable fluoropolymers used as thin films having heat resistance, chemical resistance, low refractive index, low dielectric property, lubricity, water- and oil-repellency FUJIFILM CORPORATION (JP) 2012-02-21 US disclosed
JP-2011116661-A METHOD FOR PRODUCING FLUOROALKYL ETHER DAIKIN INDUSTRIES LTD 2011-06-16 JP disclosed
US-20090318650-A1 NOVEL FLUORINE-CONTAINING POLYMER AND METHOD OF PRODUCING FLUORINE-CONTAINING POLYMER FUJIFILM CORPORATION (JP) 2009-12-24 US disclosed
US-20080255337-A1 NOVEL CROSSLINKABLE FLUORINE-CONTAINING ETHER COMPOUND FUJIFILM CORPORATION (JP) 2008-10-16 US disclosed
US-6046348-A Silane compound, method for making the same, and electrophotographic photoreceptor FUJI XEROX CO., LTD. (JP) 2000-04-04 US disclosed