Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC8 | Q9BY41 | 3/20 | 0.54 |
| ▸ | HDAC1 | Q13547 | 3/20 | 0.54 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.54 |
| ▸ | CA12 | O43570 | 2/20 | 0.54 |
| ▸ | CA1 | P00915 | 2/20 | 0.54 |
| ▸ | CA9 | Q16790 | 2/20 | 0.54 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.54 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.54 |
| ▸ | IDO1 | P14902 | 1/20 | 0.54 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.54 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.54 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.54 |
| ▸ | NCOR2 | Q9Y618 | 1/20 | 0.54 |
| ▸ | CES1 | P23141 | 3/20 | 0.44 |
| ▸ | MAPT | P10636 | 3/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3693714 | 0.88 | NPC1 (0.50) | HDAC8HDAC1HDAC3HDAC7HDAC2 | |
| SCHEMBL11808646 | 0.80 | MAPT (0.43) | HDAC8HDAC1ALOX15CA12CA1 | |
| SCHEMBL4530513 | 0.80 | TSHR (0.45) | HDAC8HDAC1ALOX15CA12CA1 | |
| SCHEMBL10477310 | 0.80 | CES1 (0.43) | HDAC8HDAC1ALOX15CA12CA1 | |
| SCHEMBL3427621 | 0.78 | KMT2A (0.55) | HSD17B10MAPTTDP1SMN1; SMN2KDM4E | |
| SCHEMBL27934182 | 0.78 | PARP1 (0.53) | MAPTTDP1SMN1; SMN2MEN1HPGD | |
| SCHEMBL223551 | 0.77 | TDP1 (0.43) | HDAC8HDAC1ALOX15CA12CA1 | |
| SCHEMBL223550 | 0.77 | MAPT (0.40) | HDAC8HDAC1ALOX15CA12CA1 | |
| SCHEMBL11359737 | 0.77 | MAPT (0.40) | HDAC8HDAC1ALOX15CA12CA1 | |
| SCHEMBL11883855 | 0.77 | AKT1 (0.47) | HDAC8HDAC1ALOX15CA12CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5998084-A | RADIATION-SENSITIVE 1,2-NAPHTHOQUINONE-2-DIAZIDE-4- OR -5-SULFONIC ACID ESTER OF A POLYCONDENSATE HAVING PHENOLIC HYDROXY GROUPS; NOVOLAK; VINYL POLYMER COMPRISING AT LEAST ONE UNIT HAVING A LATERAL HYDROXYPHENYL GROUP, CLATHRATE | AGFA-GEVAERT N.V. (BE) | 1999-12-07 | — | — | US | claimed |
| EP-0774692-B1 | Radiation-sensitive recording material for the production of planographic printing plates | AGFA GEVAERT AG (DE) | 1999-09-29 | — | — | EP | claimed |
| EP-0774692-A2 | Radiation-sensitive recording material for the production of planographic printing plates | HOECHST AKTIENGESELLSCHAFT (DE) | 1997-05-21 | — | — | EP | claimed |
| WO-2024248065-A1 | POLYMER AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME, COPPER PASTE, LIQUID COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING COPPER PILLAR FOR SEMICONDUCTOR CONNECTION | 株式会社ダイセル | 2024-12-05 | — | — | WO | disclosed |
| WO-2024248064-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME, COPPER PASTE, LIQUID COMPOSITION, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND METHOD FOR PRODUCING COPPER PILLAR FOR SEMICONDUCTOR CONNECTION | 株式会社ダイセル | 2024-12-05 | — | — | WO | disclosed |
| WO-2024248066-A1 | POLYMER, PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAME, COPPER PASTE, LIQUID COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING COPPER PILLAR FOR SEMICONDUCTOR CONNECTION | 株式会社ダイセル | 2024-12-05 | — | — | WO | disclosed |
| CN-118192168-A | Photosensitive resin composition | 日产化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| CN-110537146-B | Photosensitive resin composition | 日产化学株式会社 | 2024-03-15 | — | — | CN | disclosed |
| CN-110537147-B | Photosensitive resin composition | 日产化学株式会社 | 2024-03-12 | — | — | CN | disclosed |
| WO-2024029475-A1 | WAVELENGTH CONVERSION FILM FORMING COMPOSITION | 日産化学株式会社 | 2024-02-08 | — | — | WO | disclosed |
| CN-110573963-B | Photosensitive resin composition | 日产化学株式会社 | 2023-10-24 | — | — | CN | disclosed |
| US-20080044765-A1 | Ir Radical Polymerization-Type Photopolymer Plate Using Specific Binder Polymer | KODAK POLYCHROME GRAPHICS JAPAN LTD (JP) | 2008-02-21 | — | — | US | disclosed |
| EP-1757982-A1 | NEGATIVE PHOTOSENSITIVE COMPOSITION AND NEGATIVE PHOTOSENSITIVE LITHOGRAPHY PLATE | Kodak Polychrome Graphics Japan Ltd. (JP) | 2007-02-28 | — | — | EP | disclosed |
| EP-1453675-A1 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE | Kodak Polychrome Graphics Company Ltd. (US) | 2004-09-08 | — | — | EP | disclosed |
| WO-2003051631-A1 | PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE | KODAK POLYCHROME GRAPHICS COMPANY LTD. (US) | 2003-06-26 | — | — | WO | disclosed |
| US-5998084-A | RADIATION-SENSITIVE 1,2-NAPHTHOQUINONE-2-DIAZIDE-4- OR -5-SULFONIC ACID ESTER OF A POLYCONDENSATE HAVING PHENOLIC HYDROXY GROUPS; NOVOLAK; VINYL POLYMER COMPRISING AT LEAST ONE UNIT HAVING A LATERAL HYDROXYPHENYL GROUP, CLATHRATE | AGFA-GEVAERT N.V. (BE) | 1999-12-07 | — | — | US | disclosed |
| EP-0774692-B1 | Radiation-sensitive recording material for the production of planographic printing plates | AGFA GEVAERT AG (DE) | 1999-09-29 | — | — | EP | disclosed |
| EP-0774692-A2 | Radiation-sensitive recording material for the production of planographic printing plates | HOECHST AKTIENGESELLSCHAFT (DE) | 1997-05-21 | — | — | EP | disclosed |
| US-4188338-A | ANTICOAGULANTS | AKZONA INCORPORATED (US) | 1980-02-12 | — | — | US | disclosed |
| US-4173652-A | ANTICOAGULANTS | AKZONA INCORPORATED (US) | 1979-11-06 | — | — | US | disclosed |