⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29464081 | 1.00 | — | — | |
| SCHEMBL10659030 | 0.79 | — | — | |
| SCHEMBL3848790 | 0.77 | TDP1 (0.55) | — | |
| SCHEMBL63124 | 0.77 | — | — | |
| SCHEMBL1553731 | 0.77 | — | — | |
| SCHEMBL29464085 | 0.77 | — | — | |
| Methane SCHEMBL11480290 | 0.74 | CASP1 (0.40) | — | |
| Hydrochloric Acid SCHEMBL10452826 | 0.74 | PTK2 (0.30) | — | |
| Hydrochloric Acid SCHEMBL4292519 | 0.74 | TDP1 (0.43) | — | |
| SCHEMBL10411096 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117143464-A | Method for preparing organic pigment easy to disperse in plastic | 江苏乾润新材料科技有限公司 | 2023-12-01 | — | — | CN | claimed |
| CN-116675858-A | Preparation method of amino-terminated hyperbranched polythioether and prepared internal crosslinking modified polyurethane | 扬州市祥华新材料科技有限公司 | 2023-09-01 | — | — | CN | claimed |
| US-6875554-B2 | Positive photosensitive polyimide resin composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2005-04-05 | — | — | US | claimed |
| WO-2025047700-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM AND USE THEREOF | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025047702-A1 | COMPOSITION FOR PATTERNING AND USE OF SAME | 日産化学株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2024214539-A1 | COMPOSITION FOR FORMING WAVELENGTH CONVERSION FILM, AND COMPOUND | 日産化学株式会社 | 2024-10-17 | — | — | WO | disclosed |
| CN-118318191-A | Composition for forming wavelength conversion film | 日产化学株式会社 | 2024-07-09 | — | — | CN | disclosed |
| CN-118192168-A | Photosensitive resin composition | 日产化学株式会社 | 2024-06-14 | — | — | CN | disclosed |
| WO-2024122572-A1 | WAVELENGTH CONVERSION FILM-FORMING COMPOSITION AND FUSED THIOPHENE COMPOUND | 日産化学株式会社 | 2024-06-13 | — | — | WO | disclosed |
| CN-110537146-B | Photosensitive resin composition | 日产化学株式会社 | 2024-03-15 | — | — | CN | disclosed |
| CN-110537147-B | Photosensitive resin composition | 日产化学株式会社 | 2024-03-12 | — | — | CN | disclosed |
| US-4607095-A | Nonlinear optical organic substrate | CELANESE CORPORATION (US) | 1986-08-19 | — | — | US | disclosed |
| EP-0145727-A4 | IMPROVED POLYAMIDE-ACIDS AND POLYIMIDES. | M & T CHEMICALS INC (US) | 1985-09-18 | — | — | EP | disclosed |
| EP-0145727-A1 | IMPROVED POLYAMIDE-ACIDS AND POLYIMIDES | M & T CHEMICALS, INC. (US) | 1985-06-26 | — | — | EP | disclosed |
| US-4499149-A | ADHESION; HEAT RESISTANCE; PROTECTIVE COATINGS; SEMICONDUCTORS; POLYIMIDES | M&T CHEMICALS INC. (US) | 1985-02-12 | — | — | US | disclosed |
| WO-1984004313-A1 | IMPROVED POLYAMIDE-ACIDS AND POLYIMIDES | M & T CHEMICALS INC (US) | 1984-11-08 | — | — | WO | disclosed |
| US-4480009-A | POLYIMIDE, POLYAMIDEIMIDE, OR POLY-HALF-AMIDE | M&T CHEMICALS INC. (US) | 1984-10-30 | — | — | US | disclosed |
| US-4395527-A | POLYIMIDES FROM AMINOPOLYSILOXANES | M & T CHEMICALS INC. (US) | 1983-07-26 | — | — | US | disclosed |
| EP-0054426-A2 | Improvements in or relating to siloxanes | M & T CHEMICALS, INC. (US) | 1982-06-23 | — | — | EP | disclosed |
| US-3972890-A | ACID CATALYST | BAYER AKTIENGESELLSCHAFT (DT) | 1976-08-03 | — | — | US | disclosed |