SCHEMBL649272

SCHEMBL649272

CC(C)OCc1ccc(COC(C)C)cc1

nearest known ligand 0.44

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
IDO1 P14902 5/20 0.44
AGXT P21549 4/20 0.39
TAAR1 Q96RJ0 3/20 0.36
SLC6A2 P23975 2/20 0.36
ADRB2 P07550 1/20 0.36
ADRB1 P08588 1/20 0.36
ADRB3 P13945 1/20 0.36
ESR1 P03372 1/20 0.34
ESR2 Q92731 1/20 0.34
POLB P06746 1/20 0.34
CHRNB2 P17787 1/20 0.34
CHRNA4 P43681 1/20 0.34
SLC6A4 P31645 1/20 0.34
SLC6A3 Q01959 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1337524 0.92 IDO1 (0.41) IDO1AGXTADRB2ADRB1ADRB3
SCHEMBL12134040 0.90 ACACB (0.39) IDO1AGXTADRB2ADRB1ADRB3
SCHEMBL11979782 0.90 TAAR1 (0.50) IDO1TAAR1SLC6A2ESR1ESR2
SCHEMBL8750390 0.90 TDP1 (0.40) IDO1TAAR1POLB
SCHEMBL407132 0.90 AGXT (0.54) IDO1AGXTTAAR1
SCHEMBL8145077 0.88 IDO1 (0.47) IDO1AGXT
SCHEMBL15261000 0.88 IDO1 (0.38) IDO1AGXTTAAR1SLC6A2ADRB2
SCHEMBL6676589 0.88 IDO1 (0.52) IDO1AGXTTAAR1
SCHEMBL260335 0.88 IDO1 (0.63) IDO1ESR1ESR2POLBCHRNB2
SCHEMBL12936619 0.88 LTA4H (0.39) IDO1TAAR1SLC6A2ADRB2ADRB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 91 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024049769-A2 PATTERNED RELEASE LAYERS, AND METHODS OF MAKING AND USING THEM IN DEVICE MANUFACTURING TERECIRCUITS CORPORATION (US) 2024-03-07 WO disclosed
WO-2023200975-A1 COMPOSITE MATERIAL COMPRISING A RELEASE MATERIAL AND A THERMOPOLYMER MATERIAL, AND USES THEREOF TERECIRCUITS CORPORATION (US) 2023-10-19 WO disclosed
US-20230333475-A1 COMPOSITE MATERIAL COMPRISING A RELEASE MATERIAL AND A THERMOPOLYMER MATERIAL, AND USES THEREOF TERECIRCUITS CORPORATION 2023-10-19 US disclosed
US-20230333475-A1 COMPOSITE MATERIAL COMPRISING A RELEASE MATERIAL AND A THERMOPOLYMER MATERIAL, AND USES THEREOF TERECIRCUITS CORPORATION 2023-10-19 US disclosed
US-20230130004-A1 RELEASE LAYER COMPOSITION FOR TRANSFER OF COMPONENTS TERECIRCUITS CORPORATION 2023-04-27 US disclosed
US-20230130004-A1 RELEASE LAYER COMPOSITION FOR TRANSFER OF COMPONENTS TERECIRCUITS CORPORATION 2023-04-27 US disclosed
WO-2023023554-A1 RELEASE LAYER COMPOSITION FOR TRANSFER OF COMPONENTS TERECIRCUITS CORPORATION (US) 2023-02-23 WO disclosed
WO-2022255321-A1 INTEGRATED DICING/DIE BONDING FILM AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE 昭和電工マテリアルズ株式会社 2022-12-08 WO disclosed
WO-2022255322-A1 METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, AND DICING-DIE BONDING INTEGRATED FILM 昭和電工マテリアルズ株式会社 2022-12-08 WO disclosed
US-20220216114-A1 METHOD FOR EVALUATING PICKUP PERFORMANCE, INTEGRATED DICING/DIE-BONDING FILM, METHOD FOR EVALUATING AND SELECTING INTEGRATED DICING/DIE-BONDING FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE RESONAC CORPORATION (JP) 2022-07-07 US disclosed
US-4966961-A REACTING AROMATIC AMINE/POLYAMINE WITH MALEIC ANHYDRIDE; HEAT RESISTANCE COMPOSITES, THERMOSETTING RESINS MITSUI TOATSU CHEMICALS, INC. (JP) 1990-10-30 US disclosed
US-4959443-A HIGH STRENGTH, REACTION OF ARALKYL ALCOHOL AND AROMATIC AMINE MITSUI TOATSU CHEMICALS, INC. (JP) 1990-09-25 US disclosed
US-4937318-A Aromatic amine resins MITSUI TOATSU CHEMICALS, INC. (JP) 1990-06-26 US disclosed
EP-0342989-A2 Polymaleimide compounds and process for the preparation thereof MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-11-23 EP disclosed
EP-0311387-A2 Aromatic amine resins, their production process and thermosetting resin compositions making use of the same MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-04-12 EP disclosed
US-4783521-A Linear salicylic acid copolymers and their metal salts, production process thereof, color-developing agents comprising metal-resins of the copolymers MITSUI TOATSU CHEMICALS, INCORPORATED (JP) 1988-11-08 US disclosed
EP-0164705-B1 PROCESS FOR MANUFACTURING PHTHALALDEHYDACETALS BASF Aktiengesellschaft (DE) 1987-09-02 EP disclosed
EP-0233450-A2 Linear salicylic acid copolymers and their metal salts, production process thereof, color-developing agents comprising metal-resins of the copolymers, and color-developing sheets employing the agents MITSUI TOATSU CHEMICALS, Inc. (JP) 1987-08-26 EP disclosed
US-4588482-A Preparation of phthalaldehyde acetals BASF AKTIENGESELLSCHAFT (DE) 1986-05-13 US disclosed
EP-0164705-A2 Process for manufacturing phthalaldehydacetals BASF Aktiengesellschaft (DE) 1985-12-18 EP disclosed