⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2239500 | 0.88 | LMNA (0.33) | — | |
| SCHEMBL66298 | 0.87 | — | — | |
| SCHEMBL8607012 | 0.80 | LMNA (0.41) | — | |
| SCHEMBL1743646 | 0.73 | — | — | |
| SCHEMBL8946937 | 0.72 | LMNA (0.35) | — | |
| SCHEMBL17128630 | 0.72 | LMNA (0.35) | — | |
| SCHEMBL3824062 | 0.69 | LMNA (0.31) | — | |
| SCHEMBL28075212 | 0.69 | LMNA (0.50) | — | |
| SCHEMBL2965228 | 0.66 | CA1 (0.36) | — | |
| SCHEMBL1412725 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 709 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2017009301-A1 | ANTIFOULING COMPOSITION | JOTUN A/S (NO) | 2017-01-19 | — | — | WO | claimed |
| US-5939235-A | PHOTOSENSITIVE CURING AGENTS HAVING AT LEAST TWO ENOL ETHER GROUPS; PERMITING THE USE OF LIGHT RAYS EXTENDING OVER A WIDE RANGE OF WAVELENGTH, PROVIDING CLEAR POSITIVE IMAGES AND A WIDE DEVELOPMENT LATITUDE | FUJI PHOTO FILM CO., LTD. (JP) | 1999-08-17 | — | — | US | claimed |
| US-5364738-A | Divinyl ethers, solubility in developers | FUJI PHOTO FILM CO., LTD. (JP) | 1994-11-15 | — | — | US | claimed |
| US-20240192591-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-13 | — | — | US | disclosed |
| US-20240184199-A1 | Onium Salt, Resist Composition, And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-06 | — | — | US | disclosed |
| US-12001139-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-04 | — | — | US | disclosed |
| US-20240176235-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-30 | — | — | US | disclosed |
| US-20240176237-A1 | Onium Salt, Resist Composition, And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-30 | — | — | US | disclosed |
| US-20240176238-A1 | SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-30 | — | — | US | disclosed |
| US-11994799-B2 | Negative resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-28 | — | — | US | disclosed |
| US-20240160101-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-05-16 | — | — | US | disclosed |
| EP-0908783-A1 | Resist compositions, their preparation and use for patterning processes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| US-5882844-A | SOLVENTS, PHOTORESISTS, PHOTOACID GENERATOR AND COMPOUNDS WITH VINYL ETHERS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-03-16 | — | — | US | disclosed |
| US-5876900-A | POLYHYDROXYSTYRENE POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-03-02 | — | — | US | disclosed |
| US-5658708-A | RADIATION ABSORBING MATERIAL CONTAINING ENOL ETHER GROUPS | FUJI PHOTO FILM CO., LTD. (JP) | 1997-08-19 | — | — | US | disclosed |
| US-5637428-A | POSITIVE WORKING PHOTOSENSITIVE COMPOSITION | FUJI PHOTO FILM CO., LTD. (JP) | 1997-06-10 | — | — | US | disclosed |
| EP-0702271-A1 | Positive working printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1996-03-20 | — | — | EP | disclosed |
| US-5364738-A | Divinyl ethers, solubility in developers | FUJI PHOTO FILM CO., LTD. (JP) | 1994-11-15 | — | — | US | disclosed |
| EP-0609684-A1 | Positive-working light-sensitive composition | Fuji Photo Film Co., Ltd. (JP) | 1994-08-10 | — | — | EP | disclosed |
| EP-0536690-A1 | Light-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1993-04-14 | — | — | EP | disclosed |