Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14249133 | 0.86 | — | — | |
| SCHEMBL209752 | 0.83 | — | — | |
| SCHEMBL1394639 | 0.81 | — | — | |
| SCHEMBL21273723 | 0.81 | — | — | |
| SCHEMBL8206536 | 0.81 | — | — | |
| SCHEMBL1992039 | 0.81 | — | — | |
| SCHEMBL432683 | 0.81 | — | — | |
| SCHEMBL8209401 | 0.81 | — | — | |
| SCHEMBL8206541 | 0.81 | — | — | |
| SCHEMBL1988656 | 0.81 | ALDH1A1 (0.30) | ALDH1A1TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 745 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3435160-B1 | NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER, HAVING HIGH RESOLUTION AND HIGH ASPECT RATIO | YOUNG CHANG CHEMICAL CO LTD (KR) | 2022-05-04 | — | — | EP | claimed |
| CN-114106223-A | Catalyst system for olefin polymerization and olefin polymerization method | 中国石油化工股份有限公司 | 2022-03-01 | — | — | CN | claimed |
| CN-114106222-A | Catalyst system for olefin polymerization and olefin polymerization method | 中国石油化工股份有限公司 | 2022-03-01 | — | — | CN | claimed |
| CN-112195481-B | Method for synthesizing tetramethoxyethane by membrane electrolysis | 上海漫关越水处理有限公司 | 2021-12-10 | — | — | CN | claimed |
| CN-112195481-A | Method for large-scale clean synthesis of tetramethoxyethane by membrane electrolysis | 上海漫关越水处理有限公司 | 2021-01-08 | — | — | CN | claimed |
| EP-2914669-B1 | INKJET INK COMPOSITION | DOMINO PRINTING SCIENCES PLC (GB) | 2018-12-05 | — | — | EP | claimed |
| EP-2500407-B1 | Cleaning formulations and method of using the cleaning formulations | AIR PROD & CHEM (US) | 2017-07-19 | — | — | EP | claimed |
| EP-2290046-B1 | Water-rich stripping and cleaning formulation and method for using same | AIR PROD & CHEM (US) | 2017-04-12 | — | — | EP | claimed |
| US-9201308-B2 | Water-rich stripping and cleaning formulation and method for using same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2015-12-01 | — | — | US | claimed |
| CN-102004399-B | Water-rich stripping and cleaning formulation and method for using same | AIR PROD & CHEM | 2014-11-19 | — | — | CN | claimed |
| EP-2500407-A1 | Cleaning formulations and method of using the cleaning formulations | Air Products and Chemicals, Inc. (US) | 2012-09-19 | — | — | EP | claimed |
| US-20110212866-A1 | WATER-RICH STRIPPING AND CLEANING FORMULATION AND METHOD FOR USING SAME | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-09-01 | — | — | US | claimed |
| CN-102004399-A | Water-rich stripping and cleaning formulation and method for using same | AIR PROD & CHEM | 2011-04-06 | — | — | CN | claimed |
| EP-1914296-B1 | Stripper containing an acetal or a ketal for removing post-etched phot-resist, etch polymer and residue | AIR PROD & CHEM (US) | 2011-03-16 | — | — | EP | claimed |
| EP-2290046-A1 | Water-rich stripping and cleaning formulation and method for using same | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-03-02 | — | — | EP | claimed |
| US-7632793-B2 | Washing and cleaning agents containing acetals as organic solvents | CLARIANT PRODUKTE (DEUTSCHLAND) GMBH (DE) | 2009-12-15 | — | — | US | claimed |
| US-20080096785-A1 | Stripper Containing an Acetal or Ketal for Removing Post-Etched Photo-Resist, Etch Polymer and Residue | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-04-24 | — | — | US | claimed |
| EP-1914296-A2 | Stripper containing an acetal or a ketal for removing post-etched phot-resist, etch polymer and residue | Air Products and Chemicals, Inc. (US) | 2008-04-23 | — | — | EP | claimed |
| CN-1845890-A | Method for processing compositions containing 1,1,2,2-tetramethoxyethane and glyoxal dimethyl acetal | BASF AG (DE) | 2006-10-11 | — | — | CN | claimed |
| WO-2005090492-A1 | USE OF DIACETALS AS COALESCENT AGENTS | CLARIANT (FRANCE) (FR) | 2005-09-29 | — | — | WO | claimed |