⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL804962 | 1.00 | — | — | |
| SCHEMBL13018444 | 0.91 | — | — | |
| SCHEMBL15858060 | 0.88 | CA1 (0.32) | — | |
| SCHEMBL9859429 | 0.87 | — | — | |
| SCHEMBL412194 | 0.87 | — | — | |
| SCHEMBL825534 | 0.87 | — | — | |
| SCHEMBL608907 | 0.86 | TSHR (0.32) | — | |
| SCHEMBL1155169 | 0.86 | — | — | |
| SCHEMBL5789942 | 0.86 | — | — | |
| SCHEMBL3158779 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1287 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108271380-B | Antifouling composition | 佐敦公司 | 2020-10-23 | — | — | CN | claimed |
| CN-1692314-B | Chemical-amplification positive-working photoresist composition | TOKYO OHKA KOGYO CO LTD | 2011-08-31 | — | — | CN | claimed |
| US-5939235-A | PHOTOSENSITIVE CURING AGENTS HAVING AT LEAST TWO ENOL ETHER GROUPS; PERMITING THE USE OF LIGHT RAYS EXTENDING OVER A WIDE RANGE OF WAVELENGTH, PROVIDING CLEAR POSITIVE IMAGES AND A WIDE DEVELOPMENT LATITUDE | FUJI PHOTO FILM CO., LTD. (JP) | 1999-08-17 | — | — | US | claimed |
| US-5364738-A | Divinyl ethers, solubility in developers | FUJI PHOTO FILM CO., LTD. (JP) | 1994-11-15 | — | — | US | claimed |
| JP-5186383-A | — | — | None | — | — | JP | disclosed |
| WO-2024143461-A1 | LAMINATE, ELECTRONIC DEVICE, COVER GLASS, AND RESIN COMPOSITION | 積水化学工業株式会社 | 2024-07-04 | — | — | WO | disclosed |
| CN-118284511-A | Laminate and electronic device | 积水化学工业株式会社 | 2024-07-02 | — | — | CN | disclosed |
| US-20240210817-A1 | RESIN MOLDED ARTICLE PRODUCTION METHOD AND OPTICAL COMPONENT PRODUCTION METHOD | DAICEL CORPORATION (JP) | 2024-06-27 | — | — | US | disclosed |
| WO-2024135086-A1 | PHOTOCURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE AND DISPLAY DEVICE | 株式会社ダイセル | 2024-06-27 | — | — | WO | disclosed |
| US-20240192591-A1 | RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-13 | — | — | US | disclosed |
| US-20240184199-A1 | Onium Salt, Resist Composition, And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-06 | — | — | US | disclosed |
| US-12001139-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-06-04 | — | — | US | disclosed |
| EP-0609684-A1 | Positive-working light-sensitive composition | Fuji Photo Film Co., Ltd. (JP) | 1994-08-10 | — | — | EP | disclosed |
| JP-H05186383-A | 1,4-CYCLOHEXANEDIOL MONOVINYL ETHER | NIPPON CARBIDE IND CO INC | 1993-07-27 | — | — | JP | disclosed |
| EP-0536690-A1 | Light-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1993-04-14 | — | — | EP | disclosed |
| EP-0447115-A1 | Polyvinylether composition | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1991-09-18 | — | — | EP | disclosed |
| EP-0438629-A2 | Polymerisable mixture and its preparation | Heraeus Kulzer GmbH (DE) | 1991-07-31 | — | — | EP | disclosed |
| EP-0438628-A2 | Polymerisable mixture and its preparation | Heraeus Kulzer GmbH (DE) | 1991-07-31 | — | — | EP | disclosed |
| EP-0279005-A1 | Semi-interpenetrating polymer networks | ALLIED CORPORATION (US) | 1988-08-24 | — | — | EP | disclosed |
| US-4654379-A | VINYL ETHER AND CELLULOSE ESTER | ALLIED CORPORATION (US) | 1987-03-31 | — | — | US | disclosed |