SCHEMBL9859429

SCHEMBL9859429

C=COC1CCC(OC=C)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4434587 0.88
SCHEMBL804962 0.87
SCHEMBL65094 0.87
SCHEMBL13898345 0.87
SCHEMBL1155665 0.82
SCHEMBL1155672 0.82
SCHEMBL20712894 0.82
SCHEMBL13018444 0.79
SCHEMBL475578 0.78
SCHEMBL4196948 0.78 ALDH1A1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8822126-B2 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM CORPORATION (JP) 2014-09-02 US disclosed
US-8822126-B2 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM CORPORATION (JP) 2014-09-02 US disclosed
US-20090220752-A1 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM CORPORATION (JP) 2009-09-03 US disclosed
US-20090220752-A1 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM CORPORATION (JP) 2009-09-03 US disclosed
EP-2095947-A1 Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate FUJIFILM Corporation (JP) 2009-09-02 EP disclosed
EP-0447115-A1 Polyvinylether composition MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1991-09-18 EP disclosed
EP-0279005-A1 Semi-interpenetrating polymer networks ALLIED CORPORATION (US) 1988-08-24 EP disclosed
US-4654379-A VINYL ETHER AND CELLULOSE ESTER ALLIED CORPORATION (US) 1987-03-31 US disclosed