SCHEMBL6509729

SCHEMBL6509729

FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)CC[Si](Cl)(Cl)Cl.[SiH4]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL65442 0.98 LMNA (0.31)
SCHEMBL29832531 0.98 LMNA (0.31)
SCHEMBL14208680 0.98 LMNA (0.31)
SCHEMBL65168 0.98 LMNA (0.31)
SCHEMBL4625447 0.98 LMNA (0.31)
SCHEMBL4626440 0.98 LMNA (0.31)
SCHEMBL19064333 0.98 LMNA (0.31)
SCHEMBL29363075 0.98 LMNA (0.31)
SCHEMBL892529 0.98 LMNA (0.31)
SCHEMBL8779826 0.98 LMNA (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6860956-B2 Methods of creating patterns on substrates and articles of manufacture resulting therefrom AGENCY FOR SCIENCE, TECHNOLOGY & RESEARCH (SG) 2005-03-01 US disclosed
WO-2004107045-A2 METHODS OF CREATING PATTERNS ON SUBSTRATES AND ARTICLES OF MANUFACTURE RESULTING THEREFROM AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2004-12-09 WO disclosed
US-20040231781-A1 Methods of creating patterns on substrates and articles of manufacture resulting therefrom AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2004-11-25 US disclosed