SCHEMBL6510774

SCHEMBL6510774

CCO[Si](C)(OC(C)(C)C)OC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL838470 0.94
SCHEMBL28159390 0.87
SCHEMBL7743256 0.85
SCHEMBL734665 0.78
SCHEMBL7746300 0.76
SCHEMBL34977 0.75
SCHEMBL190678 0.75 ALDH1A1 (0.33)
SCHEMBL2312724 0.74
SCHEMBL564503 0.74
SCHEMBL2316880 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114232389-A Super-hydrophobic paper and preparation method thereof 齐鲁工业大学 2022-03-25 CN claimed
EP-1565400-A2 FUMED METAL OXIDE PARTICLES AND PROCESS FOR PRODUCING THE SAME CABOT CORPORATION (US) 2005-08-24 EP claimed
US-20040156773-A1 Fumed metal oxide particles and process for producing the same CABOT CORPORATION (US) 2004-08-12 US claimed
WO-2004048261-A2 FUMED METAL OXIDE PARTICLES AND PROCESS FOR PRODUCING THE SAME CABOT CORPORATION (US) 2004-06-10 WO claimed
US-11987501-B2 Aqueous hydrophobic silica dispersions CABOT CORPORATION (US) 2024-05-21 US disclosed
WO-2023230251-A1 AEROGEL COMPOSITION FOR THERMAL INSULATION CABOT CORPORATION (US) 2023-11-30 WO disclosed
CN-116102915-B Aqueous hydrophobic silica dispersions 卡博特公司 2023-11-28 CN disclosed
US-11788185-B2 Film formation method and film formation device TOKYO ELECTRON LIMITED (JP) 2023-10-17 US disclosed
CN-116102915-A Aqueous hydrophobic silica dispersions 卡博特公司 2023-05-12 CN disclosed
CN-111655802-B Aqueous hydrophobic silicon dioxide dispersion 卡博特公司 2023-02-21 CN disclosed
US-20230037372-A1 FILM FORMATION METHOD AND FILM FORMATION APPARATUS TOKYO ELECTRON LIMITED (JP) 2023-02-09 US disclosed
US-20230009551-A1 FILM FORMATION METHOD AND FILM FORMATION APPARATUS TOKYO ELECTRON LIMITED (JP) 2023-01-12 US disclosed
US-20220186362-A1 FILM FORMATION METHOD AND FILM FORMATION DEVICE TOKYO ELECTRON LIMITED (JP) 2022-06-16 US disclosed
CN-114232389-A Super-hydrophobic paper and preparation method thereof 齐鲁工业大学 2022-03-25 CN disclosed
CN-108889285-B Limited-feeding chromatographic packing, preparation method thereof, stationary phase containing limited-feeding chromatographic packing and application of stationary phase 纳谱分析技术(苏州)有限公司 2021-05-14 CN disclosed
US-20210053833-A1 Aqueous Hydrophobic Silica Dispersions CABOT CORPORATION 2021-02-25 US disclosed
US-10790138-B2 Method and system for selectively forming film TOKYO ELECTRON LIMITED (JP) 2020-09-29 US disclosed
CN-111655802-A Aqueous hydrophobic silicon dioxide dispersion 卡博特公司 2020-09-11 CN disclosed
WO-2019144910-A1 AQUEOUS HYDROPHOBIC SILICA DISPERSIONS CABOT CORPORATION (US) 2019-08-01 WO disclosed
US-20170133608-A1 METHOD FOR FORMING ORGANIC MONOMOLECULAR FILM AND SURFACE TREATMENT METHOD TOKYO ELECTRON LIMITED (JP) 2017-05-11 US disclosed