SCHEMBL6513247

SCHEMBL6513247

C[Zr]Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethane SCHEMBL5235299 0.67
SCHEMBL29216094 0.62
SCHEMBL28619918 0.61
Water SCHEMBL20838827 0.61
Water SCHEMBL29169974 0.61
Chloromethane SCHEMBL307557 0.61
Water SCHEMBL28908591 0.61
Chloromethane SCHEMBL2233560 0.61
Water SCHEMBL29158455 0.61
SCHEMBL150015 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240145301-A1 METAL THIN-FILM PRECURSOR COMPOSITION, METHOD OF FORMING THIN FILM USING METAL THIN-FILM PRECURSOR COMPOSITION, AND SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD SOULBRAIN CO., LTD. (KR) 2024-05-02 US disclosed
US-20240136175-A1 AUXILIARY PRECURSOR, THIN-FILM PRECURSOR COMPOSITION, METHOD OF FORMING THIN FILM, AND SEMICONDUCTOR SUBSTRATE FABRICATED USING METHOD SOULBRAIN CO., LTD. (KR) 2024-04-25 US disclosed
CN-117015630-A Metal thin film precursor composition, thin film forming method using the same, and semiconductor substrate manufactured by the method 秀博瑞殷株式公社 2023-11-07 CN disclosed
CN-116981795-A Auxiliary precursor, film precursor composition, film forming method, and semiconductor substrate manufactured by the method 秀博瑞殷株式公社 2023-10-31 CN disclosed
US-6872843-B2 Non-metallocene compounds, method for the production thereof and use of the same for the polymerization of olefins BASELL POLYOLEFINE GMBH (DE) 2005-03-29 US disclosed
US-20040023940-A1 Non-metallocene compounds, method for the production thereof and use of the same for the polymerisation of olefins EQUISTAR CHEMICALS, LP 2004-02-05 US disclosed
CN-1137148-C Catalyst system ��������ϩ����������޹�˾ 2004-02-04 CN disclosed
US-5543377-A COMPRISING GROUP IVB TRANSITION METAL COMPOUND CONTAINING CYCLOPENTADIENYL LIGAND, ALUMINOXANE, KETOALCOHOL OR BETA-DIKETONE MITSUI PETROCHEMICAL INDUSTRIES CO., LTD. (JP) 1996-08-06 US disclosed
CN-1020193-C Benzene-insoluble organoaluminum oxy-compounds and process for preparing same MITSUIPETROCHEMICAL IND LTD (JP) 1993-03-31 CN disclosed
CN-1041597-A Benzene-insoluble Organoaluminoxy based compound and preparation method thereof MITSUI PETROCHEMICAL IND (JP) 1990-04-25 CN disclosed