Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 2/20 | 0.95 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.95 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.62 |
| ▸ | CA12 | O43570 | 5/20 | 0.58 |
| ▸ | CA6 | P23280 | 5/20 | 0.58 |
| ▸ | CA7 | P43166 | 5/20 | 0.58 |
| ▸ | CA9 | Q16790 | 5/20 | 0.58 |
| ▸ | CA14 | Q9ULX7 | 5/20 | 0.58 |
| ▸ | CA5B | Q9Y2D0 | 5/20 | 0.58 |
| ▸ | CA2 | P00918 | 4/20 | 0.58 |
| ▸ | CA4 | P22748 | 4/20 | 0.58 |
| ▸ | CA5A | P35218 | 4/20 | 0.58 |
| ▸ | CA3 | P07451 | 3/20 | 0.58 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.58 |
| ▸ | LMNA | P02545 | 2/20 | 0.58 |
| ▸ | CA1 | P00915 | 2/20 | 0.58 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.58 |
| ▸ | TP53 | P04637 | 1/20 | 0.58 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.55 |
| ▸ | MEN1 | O00255 | 2/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1231146 | 1.00 | CYP2C19 (0.95) | CYP2C19CYP2C9TDP1CA12CA6 | |
| SCHEMBL28656687 | 1.00 | CYP2C19 (0.95) | CYP2C19CYP2C9TDP1CA12CA6 | |
| SCHEMBL323253 | 0.97 | — | — | |
| Hydrochloric Acid SCHEMBL16497585 | 0.95 | CYP2C19 (0.95) | CYP2C19CYP2C9TDP1CA12CA6 | |
| SCHEMBL11691403 | 0.91 | CYP2C19 (0.78) | CYP2C19CYP2C9TDP1CA12CA6 | |
| SCHEMBL18576277 | 0.90 | TDP1 (0.78) | CYP2C19CYP2C9TDP1CA12CA6 | |
| SCHEMBL28371432 | 0.87 | TDP1 (0.82) | CYP2C19CYP2C9TDP1CA12CA6 | |
| SCHEMBL2182907 | 0.87 | TDP1 (0.82) | CYP2C19CYP2C9TDP1CA12CA6 | |
| SCHEMBL65120 | 0.86 | CYP2C19 (0.68) | CYP2C19CYP2C9TDP1CA12CA6 | |
| SCHEMBL347138 | 0.86 | CYP2C19 (0.68) | CYP2C19CYP2C9TDP1CA12CA6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1079 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250333584-A1 | TYRE FOR VEHICLE WHEELS | PIRELLI (IT) | 2025-10-30 | — | — | US | claimed |
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | claimed |
| US-20250199405-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | YCCHEM CO., LTD. (KR) | 2025-06-19 | — | — | US | claimed |
| CN-119998727-A | Chemically amplified positive resist composition for improving pattern profile and enhancing etch resistance | YC化学制品株式会社 | 2025-05-13 | — | — | CN | claimed |
| EP-4526379-A1 | TYRE FOR VEHICLE WHEELS | Pirelli Tyre S.p.A. (IT) | 2025-03-26 | — | — | EP | claimed |
| WO-2023223249-A1 | TYRE FOR VEHICLE WHEELS | PIRELLI TYRE S.P.A. (IT) | 2023-11-23 | — | — | WO | claimed |
| US-12630742-B2 | Polishing composition using polishing particles containing basic substance and having high water affinity | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-19 | — | — | US | disclosed |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4660703-A2 | METAL-CONTAINING FILM PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250372377-A1 | METAL-CONTAINING FILM PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-04 | — | — | US | disclosed |
| US-20250333584-A1 | TYRE FOR VEHICLE WHEELS | PIRELLI (IT) | 2025-10-30 | — | — | US | disclosed |
| EP-4607278-A1 | CHEMICALLY-AMPLIFIED POSITIVE PHOTORESIST COMPOSITION FOR PATTERN PROFILE IMPROVEMENT AND ETCH RESISTANCE ENHANCEMENT | Ycchem Co., Ltd. (KR) | 2025-08-27 | — | — | EP | disclosed |
| US-20250251665-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PHOTOSENSITIVE DRY FILM, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-08-07 | — | — | US | disclosed |
| US-5972559-A | A PHOTORESIST MIXTURE COMPRISING AN ORGANIC SOLVENT, A COPOLYCARBONS BASE RESIN, A PHOTOACID GENERATOR, AND AN AROMATIC ALKYLENE CARBOXYLIC ACID COMPOUND; FOR IMPROVING THE FOOTING ON NITRIDE FILM SUBSTRATES AND POST EXPOSURE DELAY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-10-26 | — | — | US | disclosed |
| US-5972560-A | A CROSSLINKED POLYSILOXANE PHOTOACID GENERATOR HAVING HIGH TRANSPARENCY, HIGH RESOLUTION, IMPROVED LATITUDE OF EXPOSURE, PROCESS ADAPTABILITY, AND FOR PRECISE MICRO-PROCESSING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-10-26 | — | — | US | disclosed |
| US-5942367-A | HIGH SENSITIVITY, RESOLUTION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-08-24 | — | — | US | disclosed |
| EP-0908783-A1 | Resist compositions, their preparation and use for patterning processes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| EP-0908473-A1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| US-5876900-A | POLYHYDROXYSTYRENE POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-03-02 | — | — | US | disclosed |
| US-4578517-A | Polyalkylene polyamines from alkanolamine and ammonia or amines using group IIIB metal acid phosphate catalysts | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1986-03-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12630742-B2 | Polishing composition using polishing particles containing basic substance and having high water affinity | POLR1A, PRMT1, SRRM2 | CYP2C19 4649/4885CYP2C9 4751/4885TDP1 893/4885 |
| US-12583973-B2 | Polyimide-based polymer, positive photosensitive resin composition, negative photosensitive resin composition, patterning method, method for forming cured film, interlayer insulating film, surface protective film, and electronic component | PRDM9, ARCN1, PUF60 | CYP2C19 3261/4885CYP2C9 3892/4885TDP1 563/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.