SCHEMBL6520648

SCHEMBL6520648

O=C(CC(=O)C(F)(F)F)C(F)(F)F.[Cu]

nearest known ligand 0.44

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
PLOD2 O00469 3/20 0.44
PLOD3 O60568 2/20 0.43
PLOD1 Q02809 2/20 0.43
FAAH O00519 8/20 0.42
CES1 P23141 7/20 0.40
CES2 O00748 2/20 0.40
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
CYP1A2 P05177 1/20 0.40
HSD17B10 Q99714 1/20 0.40
CA2 P00918 1/20 0.40
ALDH1A1 P00352 1/20 0.39
POLB P06746 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
HDAC6 Q9UBN7 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL183178 0.96 PLOD2 (0.46) PLOD2PLOD3PLOD1FAAHCES1
Water SCHEMBL7197275 0.93 PLOD2 (0.44) PLOD2PLOD3PLOD1FAAHCES1
SCHEMBL7213763 0.93 PLOD2 (0.44) PLOD2PLOD3PLOD1FAAHCES1
SCHEMBL31622638 0.93 PLOD2 (0.44) PLOD2PLOD3PLOD1FAAHCES1
SCHEMBL6517983 0.93 PLOD2 (0.44) PLOD2PLOD3PLOD1FAAHCES1
SCHEMBL9326020 0.93 PLOD2 (0.44) PLOD2PLOD3PLOD1FAAHCES1
SCHEMBL9283764 0.93 PLOD2 (0.44) PLOD2PLOD3PLOD1FAAHCES1
Water SCHEMBL7191917 0.93 PLOD2 (0.44) PLOD2PLOD3PLOD1FAAHCES1
SCHEMBL31182132 0.93 PLOD2 (0.44) PLOD2PLOD3PLOD1FAAHCES1
SCHEMBL30106460 0.93 PLOD2 (0.44) PLOD2PLOD3PLOD1FAAHCES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112538611-B Graphene carbon nanotube composite film, preparation method thereof and thin film transistor array 北海惠科光电技术有限公司 2022-07-22 CN claimed
CN-100420519-C Catalyst composition and process for chlorinating aromatic compounds GEN ELECTRIC (US) 2008-09-24 CN claimed
CN-1791464-A Catalyst composition and process for chlorinating aromatic compounds GEN ELECTRIC (US) 2006-06-21 CN claimed
CN-112538611-B Graphene carbon nanotube composite film, preparation method thereof and thin film transistor array 北海惠科光电技术有限公司 2022-07-22 CN disclosed
CN-105753748-B A kind of synthetic method of medicine intermediate sulphonyl class compound 南京励合化学新材料有限公司 2018-05-29 CN disclosed
CN-101345210-A Process for forming continuous copper thin films via vapor deposition AIR PROD & CHEM (US) 2009-01-14 CN disclosed
US-20050058835-A1 Impregnation of polymeric substrates wit antimicrobal substances using superficial fluids NOTTINGHAM, UNIVERSITY OF, THE (GB) 2005-03-17 US disclosed
CN-1168130-C Method of forming copper wiring in semiconductor device �ִ����Ӳ�ҵ��ʽ���� 2004-09-22 CN disclosed
CN-1168131-C Method of forming copper wiring in semiconductor device �ִ����Ӳ�ҵ��ʽ���� 2004-09-22 CN disclosed
CN-1308371-A Method of forming copper wiring in semiconductor device HYUNDAI ELECTRONICS IND (KR) 2001-08-15 CN disclosed
CN-1308370-A Method of forming copper wiring in semiconductor device HYUNDAI ELECTRONICS IND (KR) 2001-08-15 CN disclosed