SCHEMBL6522104

SCHEMBL6522104

CCCC[SiH2]C1C=CC([SiH2]CCCC)C=C1

nearest known ligand 0.32

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.32
LMNA P02545 1/20 0.32
THRB P10828 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6525775 0.92 TSHR (0.35) TSHRLMNATHRB
SCHEMBL6525962 0.90 TSHR (0.40) TSHRLMNATHRB
SCHEMBL6520196 0.90 TSHR (0.40) TSHRLMNATHRB
SCHEMBL6525367 0.90 TSHR (0.40) TSHRLMNATHRB
SCHEMBL6517106 0.90 TSHR (0.40) TSHRLMNATHRB
SCHEMBL4359350 0.84
SCHEMBL6523472 0.82
SCHEMBL4352858 0.75 TSHR (0.32) TSHRTHRB
SCHEMBL4352710 0.75 TSHR (0.32) TSHRTHRB
SCHEMBL4355198 0.75 TSHR (0.32) TSHRTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8487071-B2 Polyether polymer and production process thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-16 US disclosed
US-20110065889-A1 POLYETHER POLYMER AND PRODUCTION PROCESS THEREOF SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed