SCHEMBL6525775

SCHEMBL6525775

CCCCC[SiH2]C1C=CC([SiH2]CCCCC)C=C1

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.35
THRB P10828 1/20 0.35
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6525962 0.97 TSHR (0.40) TSHRTHRBLMNA
SCHEMBL6523354 0.97 TSHR (0.40) TSHRTHRBLMNA
SCHEMBL6525367 0.97 TSHR (0.40) TSHRTHRBLMNA
SCHEMBL6517106 0.97 TSHR (0.40) TSHRTHRBLMNA
SCHEMBL6522104 0.92 TSHR (0.32) TSHRTHRBLMNA
SCHEMBL4352710 0.83 TSHR (0.32) TSHRTHRB
SCHEMBL4352858 0.83 TSHR (0.32) TSHRTHRB
SCHEMBL4355198 0.83 TSHR (0.32) TSHRTHRB
SCHEMBL6523472 0.80
Hexane SCHEMBL22639024 0.65 TSHR (0.37) TSHRTHRBLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8487071-B2 Polyether polymer and production process thereof SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2013-07-16 US disclosed
US-20110065889-A1 POLYETHER POLYMER AND PRODUCTION PROCESS THEREOF SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed