⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11791136 | 0.90 | — | — | |
| SCHEMBL11791149 | 0.90 | — | — | |
| SCHEMBL8467795 | 0.80 | — | — | |
| SCHEMBL9508997 | 0.75 | THRB (0.31) | — | |
| SCHEMBL899228 | 0.72 | — | — | |
| SCHEMBL516933 | 0.72 | — | — | |
| SCHEMBL9442923 | 0.69 | — | — | |
| SCHEMBL676166 | 0.69 | — | — | |
| SCHEMBL1358477 | 0.69 | — | — | |
| Propene SCHEMBL8401471 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150183912-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| US-8969483-B2 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8802783-B2 | — | — | 2014-08-12 | — | — | US | disclosed |
| US-8802798-B2 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2014-08-12 | — | — | US | disclosed |
| EP-1699850-B1 | POLYMER PURIFICATION | DUPONT ELECTRONIC POLYMERS L P (US) | 2014-06-25 | — | — | EP | disclosed |
| US-20130122419-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION (JP) | 2013-05-16 | — | — | US | disclosed |
| US-20120178023-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION | 2012-07-12 | — | — | US | disclosed |
| US-8119751-B2 | — | — | 2012-02-21 | — | — | US | disclosed |
| US-20110196122-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION | 2011-08-11 | — | — | US | disclosed |
| US-20090023878-A1 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION | 2009-01-22 | — | — | US | disclosed |
| US-7432035-B2 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2008-10-07 | — | — | US | disclosed |
| US-20070218403-A1 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION | 2007-09-20 | — | — | US | disclosed |
| US-7186495-B2 | (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2007-03-06 | — | — | US | disclosed |
| US-7148320-B2 | Polymer purification | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2006-12-12 | — | — | US | disclosed |
| EP-1699850-A1 | POLYMER PURIFICATION | Dupont Electronic Polymers L.P. (US) | 2006-09-13 | — | — | EP | disclosed |
| US-20050187377-A1 | Polymer purification | DUPONT ELECTRONIC POLYMERS L. P. | 2005-08-25 | — | — | US | disclosed |
| WO-2005061590-A1 | POLYMER PURIFICATION | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2005-07-07 | — | — | WO | disclosed |
| US-20010026901-A1 | (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2001-10-04 | — | — | US | disclosed |
| US-6106998-A | PHOTORESISTS SUITABLE FOR USE IN PHOTOLITHOGRAPHY THAT EMPLOYS AN ARF EXCIMER LASER; HIGH TRANSPARENCY TO EXPOSURE LIGHT HAVING A WAVELENGTH OF 220 NM OR LESS AND DRY-ETCH RESISTANCE | NEC CORPORATION (JP) | 2000-08-22 | — | — | US | disclosed |