Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 13/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.43 |
| ▸ | PKM | P14618 | 3/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | MAPT | P10636 | 2/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5175177 | 0.83 | KDM4E (0.42) | KDM4EALDH1A1TDP1PKMTSHR | |
| SCHEMBL17934358 | 0.81 | SLC6A12 (0.45) | KDM4EALDH1A1TDP1PKMTSHR | |
| SCHEMBL29936790 | 0.81 | SLC6A12 (0.45) | KDM4EALDH1A1TDP1PKMTSHR | |
| SCHEMBL9887148 | 0.81 | SLC6A12 (0.45) | KDM4EALDH1A1TDP1PKMTSHR | |
| SCHEMBL560786 | 0.81 | SLC6A12 (0.45) | KDM4EALDH1A1TDP1PKMTSHR | |
| SCHEMBL23694121 | 0.81 | SLC6A12 (0.45) | KDM4EALDH1A1TDP1PKMTSHR | |
| SCHEMBL75258 | 0.81 | SLC6A12 (0.45) | KDM4EALDH1A1TDP1PKMTSHR | |
| SCHEMBL1787909 | 0.81 | SLC6A12 (0.45) | KDM4EALDH1A1TDP1PKMTSHR | |
| SCHEMBL17331216 | 0.81 | SLC6A12 (0.45) | KDM4EALDH1A1TDP1PKMTSHR | |
| SCHEMBL5959948 | 0.80 | KDM4E (0.37) | KDM4EALDH1A1TDP1PKMTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8178629-B2 | Conjugated polymer fiber, preparation and use thereof | UNIVERSITY OF CONNECTICUT (US) | 2012-05-15 | — | — | US | claimed |
| US-9151888-B2 | Optical waveguide and electronic device | SUMITOMO BAKELITE CO., LTD. (JP) | 2015-10-06 | — | — | US | disclosed |
| US-20150183912-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION (JP) | 2015-07-02 | — | — | US | disclosed |
| US-8969483-B2 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8802783-B2 | — | — | 2014-08-12 | — | — | US | disclosed |
| US-8802798-B2 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2014-08-12 | — | — | US | disclosed |
| EP-1699850-B1 | POLYMER PURIFICATION | DUPONT ELECTRONIC POLYMERS L P (US) | 2014-06-25 | — | — | EP | disclosed |
| US-8699841-B2 | Photosensitive resin composition, optical waveguide film, film for forming optical waveguide, optical interconnect, opto-electric hybrid circuit board, electronic device, and a method of manufacturing an optical waveguide film | SUMITOMO BAKELITE CO., LTD. (JP) | 2014-04-15 | — | — | US | disclosed |
| US-20130170803-A1 | OPTICAL WAVEGUIDE AND ELECTRONIC DEVICE | SUMITOMO BAKELITE CO., LTD. (JP) | 2013-07-04 | — | — | US | disclosed |
| US-20130122419-A1 | (METH)ACRYLATE DERIVATIVE, POLYMER AND PHOTORESIST COMPOSITION HAVING LACTONE STRUCTURE, AND METHOD FOR FORMING PATTERN BY USING IT | NEC CORPORATION (JP) | 2013-05-16 | — | — | US | disclosed |
| US-20090023878-A1 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION | 2009-01-22 | — | — | US | disclosed |
| US-7432035-B2 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2008-10-07 | — | — | US | disclosed |
| US-20070218403-A1 | (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION | 2007-09-20 | — | — | US | disclosed |
| US-7186495-B2 | (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2007-03-06 | — | — | US | disclosed |
| US-7148320-B2 | Polymer purification | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2006-12-12 | — | — | US | disclosed |
| EP-1699850-A1 | POLYMER PURIFICATION | Dupont Electronic Polymers L.P. (US) | 2006-09-13 | — | — | EP | disclosed |
| US-20050187377-A1 | Polymer purification | DUPONT ELECTRONIC POLYMERS L. P. | 2005-08-25 | — | — | US | disclosed |
| WO-2005061590-A1 | POLYMER PURIFICATION | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2005-07-07 | — | — | WO | disclosed |
| US-20010026901-A1 | (Meth) acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it | NEC CORPORATION (JP) | 2001-10-04 | — | — | US | disclosed |
| US-6106998-A | PHOTORESISTS SUITABLE FOR USE IN PHOTOLITHOGRAPHY THAT EMPLOYS AN ARF EXCIMER LASER; HIGH TRANSPARENCY TO EXPOSURE LIGHT HAVING A WAVELENGTH OF 220 NM OR LESS AND DRY-ETCH RESISTANCE | NEC CORPORATION (JP) | 2000-08-22 | — | — | US | disclosed |