SCHEMBL6536610

SCHEMBL6536610

CCCCCCCCCCCCCCCCC=CC(CC(N)=O)C(N)=O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 5/20 0.56
KMT2A Q03164 5/20 0.56
FAAH O00519 3/20 0.56
CYP1A2 P05177 3/20 0.56
CYP2C19 P33261 3/20 0.56
SOAT1 P35610 2/20 0.56
TP53 P04637 2/20 0.56
CYP3A4 P08684 2/20 0.56
KDM4E B2RXH2 2/20 0.51
CNR1 P21554 1/20 0.49
MAPT P10636 4/20 0.45
GMNN O75496 3/20 0.45
LMNA P02545 3/20 0.45
POLB P06746 3/20 0.45
BLM P54132 3/20 0.45
GLA P06280 2/20 0.45
THRB P10828 2/20 0.45
CETP P11597 2/20 0.45
MAPK1 P28482 2/20 0.45
CXCR5 P32302 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL620315 1.00 MEN1 (0.56) MEN1KMT2AFAAHCYP1A2CYP2C19
SCHEMBL560615 1.00 MEN1 (0.56) MEN1KMT2AFAAHCYP1A2CYP2C19
SCHEMBL560891 1.00 MEN1 (0.56) MEN1KMT2AFAAHCYP1A2CYP2C19
SCHEMBL17294872 1.00 MEN1 (0.56) MEN1KMT2AFAAHCYP1A2CYP2C19
SCHEMBL17294870 1.00 MEN1 (0.56) MEN1KMT2AFAAHCYP1A2CYP2C19
SCHEMBL620317 1.00 MEN1 (0.56) MEN1KMT2AFAAHCYP1A2CYP2C19
SCHEMBL161178 1.00 MEN1 (0.56) MEN1KMT2AFAAHCYP1A2CYP2C19
SCHEMBL560613 1.00 MEN1 (0.56) MEN1KMT2AFAAHCYP1A2CYP2C19
Propylamine SCHEMBL25304295 0.94 MEN1 (0.50) MEN1KMT2AFAAHCYP1A2CYP2C19
Acetic Acid SCHEMBL28338605 0.94 FAAH (0.50) MEN1KMT2AFAAHCYP1A2CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113845809-B Cleaning-free antirust material capable of being stripped or cleaned by heating as well as preparation and application thereof 山立欣业新材料(广东)有限公司 2022-04-15 CN disclosed
CN-113845809-A Cleaning-free antirust material capable of being stripped or cleaned by heating as well as preparation and application thereof 山立欣业新材料(广东)有限公司 2021-12-28 CN disclosed
CN-106994627-B Composition for polishing and its manufacturing method and magnetic grinding method 福吉米株式会社 2018-06-29 CN disclosed
CN-106994627-A Composition for polishing and its manufacture method and magnetic Ginding process 福吉米株式会社 2017-08-01 CN disclosed
US-6818388-B2 Silver halide color photographic photosensitive material and process for forming color image FUJI PHOTO FILM CO., LTD. (JP) 2004-11-16 US disclosed
US-20040072109-A1 Silver halide color photographic photosensitive material and process for forming color image FUJI PHOTO FILM CO., LTD. 2004-04-15 US disclosed
US-6649333-B2 Whiteness, production stability, performance stability with respect to long-term storage in an unexposed state FUJI PHOTO FILM CO., LTD. (JP) 2003-11-18 US disclosed
US-20030157443-A1 Silver halide color photographic photosensitive material and process for forming color image FUJI PHOTO FILM CO., LTD. 2003-08-21 US disclosed