SCHEMBL6536778

SCHEMBL6536778

C=COC(C)N1CCCC1=O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.40
CA12 O43570 1/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40
CA3 P07451 1/20 0.40
CA4 P22748 1/20 0.40
CA6 P23280 1/20 0.40
CA5A P35218 1/20 0.40
CA7 P43166 1/20 0.40
CA9 Q16790 1/20 0.40
CA13 Q8N1Q1 1/20 0.40
CA14 Q9ULX7 1/20 0.40
CA5B Q9Y2D0 1/20 0.40
CHRM2 P08172 1/20 0.40
CHRM4 P08173 1/20 0.40
CHRM5 P08912 1/20 0.40
CHRM1 P11229 1/20 0.40
CHRM3 P20309 1/20 0.40
PIK3CD O00329 1/20 0.38
BRD4 O60885 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27877976 0.84 LMNA (0.41) LMNACA12CA1CA2CA3
SCHEMBL28273716 0.84 LMNA (0.41) LMNACA12CA1CA2CA3
SCHEMBL27711375 0.79 CHRM2 (0.40) LMNACA12CA1CA2CA3
SCHEMBL7999382 0.78 LMNA (0.41) LMNACA12CA1CA2CA3
SCHEMBL6573472 0.77 LMNA (0.44) LMNACA12CA1CA2CA3
SCHEMBL4151214 0.77 LMNA (0.43) LMNACA12CA1CA2CA3
SCHEMBL10571833 0.76 LMNA (0.43) LMNACA12CA1CA2CA3
SCHEMBL2451756 0.76 LMNA (0.43) LMNACA12CA1CA2CA3
SCHEMBL8865429 0.73 LMNA (0.49) LMNACA12CA1CA2CA3
SCHEMBL11794665 0.73 LMNA (0.45) LMNACA12CA1CA2CA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6727033-B2 A POSITIVE RESIST COMPOSITION COMPRISING A RESIN (A), WHICH IS DECOMPOSED BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPING SOLUTION, CONTAINING A STRUCTURAL UNIT INCLUDING A GROUP REPRESENTED BY FORMULA (X) DEFINED IN FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 US disclosed
US-20030134221-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-07-17 US disclosed