SCHEMBL6537879

SCHEMBL6537879

CCc1c(N)cc2c(c1N)C(C)(C)CC2

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
LIMK1 P53667 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6538028 0.87 LIMK1 (0.30) LIMK1
SCHEMBL6538357 0.84 SKP2 (0.37)
SCHEMBL6537903 0.77 LIMK1 (0.33) LIMK1
SCHEMBL6537762 0.76 EEF2K (0.36)
SCHEMBL6538512 0.76
SCHEMBL6538093 0.75 LIMK1 (0.32) LIMK1
SCHEMBL6937299 0.73 LIMK1 (0.31) LIMK1
SCHEMBL6538263 0.70
SCHEMBL6538117 0.69 LIMK1 (0.35) LIMK1
SCHEMBL6538417 0.66

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4987261-A Diaminoindane derivatives MITSUI TOATSU CHEMICALS, INC. (JP) 1991-01-22 US claimed
EP-1225192-B1 POLYIMIDES AND POLYAMIC ACIDS MITSUI CHEMICALS INC (JP) 2004-09-22 EP disclosed
US-6599675-B2 Useful for application of photoresist, as an insulation film; heat resistance, mechanical properties and adhesion property MITSUI CHEMICALS, INC. (JP) 2003-07-29 US disclosed
US-20020182536-A1 Polyimides and polyamic acids MITSUI CHEMICALS, INC. (JP) 2002-12-05 US disclosed
EP-1225192-A1 POLYIMIDES AND POLYAMIC ACIDS Mitsui Chemicals, Inc. (JP) 2002-07-24 EP disclosed
US-4987261-A Diaminoindane derivatives MITSUI TOATSU CHEMICALS, INC. (JP) 1991-01-22 US disclosed