Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.68 |
| ▸ | PKM | P14618 | 1/20 | 0.68 |
| ▸ | POLB | P06746 | 2/20 | 0.60 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.54 |
| ▸ | GAA | P10253 | 2/20 | 0.54 |
| ▸ | HTT | P42858 | 1/20 | 0.54 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.45 |
| ▸ | GLA | P06280 | 1/20 | 0.42 |
| ▸ | DRD3 | P35462 | 1/20 | 0.40 |
| ▸ | HRH3 | Q9Y5N1 | 3/20 | 0.39 |
| ▸ | HRH2 | P25021 | 1/20 | 0.39 |
| ▸ | HRH1 | P35367 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL27570521 | 0.98 | ALDH1A1 (0.65) | ALDH1A1PKMPOLBSMN1; SMN2HSD17B10 | |
| SCHEMBL149409 | 0.86 | MAPT (0.57) | ALDH1A1PKMPOLBSMN1; SMN2HSD17B10 | |
| SCHEMBL151040 | 0.85 | MAPT (0.67) | ALDH1A1PKMPOLBSMN1; SMN2HSD17B10 | |
| Propionic Acid SCHEMBL3867742 | 0.84 | HSD17B10 (0.54) | ALDH1A1PKMPOLBSMN1; SMN2HSD17B10 | |
| SCHEMBL7230671 | 0.83 | MAPT (0.64) | ALDH1A1PKMPOLBSMN1; SMN2HSD17B10 | |
| SCHEMBL383162 | 0.82 | — | — | |
| SCHEMBL1344289 | 0.82 | ALDH1A1 (1.00) | ALDH1A1PKMPOLBSMN1; SMN2HSD17B10 | |
| SCHEMBL21981614 | 0.81 | MAPT (0.62) | ALDH1A1PKMPOLBSMN1; SMN2HSD17B10 | |
| SCHEMBL11126503 | 0.80 | TSHR (0.46) | ALDH1A1PKMPOLBSMN1; SMN2HSD17B10 | |
| SCHEMBL14007436 | 0.80 | HSD17B10 (0.58) | ALDH1A1PKMPOLBSMN1; SMN2HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 614 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025119782-A1 | METHOD FOR THE MANUFACTURE OF NEW AMINE | EVONIK OPERATIONS GMBH (DE) | 2025-06-12 | — | — | WO | claimed |
| CN-118904863-A | Recycling method of polyester cotton spandex blended fabric | 青岛阿脒诺材料技术有限公司 | 2024-11-08 | — | — | CN | claimed |
| CN-118893071-A | Method for recycling polyester cotton blended fabric | 青岛阿脒诺材料技术有限公司 | 2024-11-05 | — | — | CN | claimed |
| EP-2605289-B1 | TEXTURE-ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND METHOD FOR TEXTURE-ETCHING | DONGWOO FINE CHEM CO LTD (KR) | 2019-10-02 | — | — | EP | claimed |
| US-9305792-B2 | Texture-etchant composition for crystalline silicon wafer and method for texture-etching (1) | DONGWOO FINE-CHEM CO., LTD. (KR) | 2016-04-05 | — | — | US | claimed |
| CN-103108992-B | Texture etching solution composition for crystalline silicon wafer and texture etching method (2) | DONGWOO FINE-CHEM CO.,LTD. (KR) | 2015-09-02 | — | — | CN | claimed |
| CN-103069049-B | Texture etching solution compositon and texture etching method of crystalline silicon wafers (1) | DONGWOO FINE CHEM CO LTD | 2015-06-17 | — | — | CN | claimed |
| EP-2604724-B1 | TEXTURE-ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND METHOD FOR TEXTURE-ETCHING (2) | DONGWOO FINE CHEM CO LTD (KR) | 2015-02-25 | — | — | EP | claimed |
| CN-104216242-A | Stripping composition used for color photoresist and organic insulating film | DONGWOO FINE CHEM CO LTD | 2014-12-17 | — | — | CN | claimed |
| EP-2604724-A2 | TEXTURE-ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND METHOD FOR TEXTURE-ETCHING (2) | Dongwoo Fine-Chem Co., Ltd. (KR) | 2013-06-19 | — | — | EP | claimed |
| CN-1660825-A | Method for preparing N-amino propyl morpholine | JIHUA GROUP CO (CN) | 2005-08-31 | — | — | CN | claimed |
| US-6743564-B2 | A POSITIVE RESIST FORMULATION CONSISTS OF NITRILE CONTAINING TERT-AMINE COMPOUND, AN ORGANIC SOLVENT AND A BASE RESIN HAVING AN ACIDIC FUNCTIONAL GROUP WHICH IS PROTECTED WITH AN ACID LABILE GROUP, A PHOTOACID GENERATOR | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-06-01 | — | — | US | claimed |
| EP-0743574-B1 | Migration imaging members | XEROX CORP (US) | 2000-12-27 | — | — | EP | claimed |
| EP-0743573-B1 | Method for obtaining image contrast migration imaging members | XEROX CORP (US) | 2000-09-06 | — | — | EP | claimed |
| EP-0129819-B1 | METHOD OF IMPREGNATING AND ENVELOPING ELECTRICAL COILS | SIEMENS AKTIENGESELLSCHAFT (DE) | 1987-01-07 | — | — | EP | claimed |
| US-4576768-A | Method for impregnating and embedding electrical windings | SIEMENS AKTIENGESELLSCHAFT (DE) | 1986-03-18 | — | — | US | claimed |
| EP-0129819-A1 | Method of impregnating and enveloping electrical coils | SIEMENS AKTIENGESELLSCHAFT (DE) | 1985-01-02 | — | — | EP | claimed |
| US-4304818-A | POLYISOCYANURATE-OXAZOLIDONES FROM POLYISOCYANATE AND POLYEPOXIDE | HITACHI, LTD. (JP) | 1981-12-08 | — | — | US | claimed |
| US-4016243-A | Hydrogen peroxide stabilization with 3-n-morpholinylpropionitriles | PPG INDUSTRIES, INC. (US) | 1977-04-05 | — | — | US | claimed |
| US-3979365-A | FROM A POLYOXAZOLIDINE PREPOLYMER AND POLYISOCYANATE | HITACHI, LTD. (JA) | 1976-09-07 | — | — | US | claimed |