SCHEMBL6542953

SCHEMBL6542953

O=C(CBr)c1cc(Br)c2ccccc2c1O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 4/20 0.50
HPGDS O60760 1/20 0.44
HMGB1 P09429 1/20 0.44
CXCL12 P48061 1/20 0.44
HSD17B10 Q99714 3/20 0.43
HPGD P15428 2/20 0.43
CYP2C9 P11712 2/20 0.43
THRB P10828 1/20 0.43
TSHR P16473 1/20 0.43
ALOX12 P18054 1/20 0.43
ATIC P31939 1/20 0.43
KDM4E B2RXH2 4/20 0.42
MCL1 Q07820 4/20 0.42
MEN1 O00255 3/20 0.42
MAPT P10636 3/20 0.42
KMT2A Q03164 3/20 0.42
NSD2 O96028 1/20 0.42
POLB P06746 1/20 0.42
ALDH1A1 P00352 2/20 0.41
GAA P10253 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19423432 0.80 HSD17B10 (0.47) HMGB1CXCL12HSD17B10HPGDCYP2C9
SCHEMBL485235 0.80 HSD17B10 (0.67) PTPN1HMGB1CXCL12HSD17B10HPGD
SCHEMBL23535393 0.78 HPGDS (0.66) PTPN1HPGDSHMGB1CXCL12HSD17B10
SCHEMBL203976 0.77 HPGDS (0.60) PTPN1HPGDSKDM4EMEN1MAPT
SCHEMBL6931711 0.76 CYP2C9 (0.44) HMGB1CXCL12HSD17B10HPGDCYP2C9
SCHEMBL9091761 0.75 MEN1 (0.50) HSD17B10HPGDCYP2C9THRBTSHR
SCHEMBL26657579 0.75 MEN1 (0.45) HMGB1CXCL12HSD17B10HPGDCYP2C9
SCHEMBL9657406 0.74 BRD4 (0.47) HMGB1CXCL12HPGDKDM4EMCL1
SCHEMBL3238108 0.74 GSK3B (0.41) PTPN1TSHRKDM4EMEN1MAPT
SCHEMBL4519224 0.73 PTPN1 (0.65) PTPN1HPGDSHSD17B10HPGDCYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-7159992-A None JP disclosed
US-6790564-B2 FOR USE IN PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES; EFFICIENCY RENESAS TECHNOLOGY CORPORATION (JP) 2004-09-14 US disclosed
EP-0911153-B1 Image forming method KONISHIROKU PHOTO IND (JP) 2003-12-10 EP disclosed
US-20020086222-A1 Photomask and manufacturing method of an electronic device therewith RENESAS ELECTRONICS CORPORATION (JP) 2002-07-04 US disclosed
US-6319649-B1 CAN FORM PATTERN WITH HIGH SENSITIVITY, RESOLUTION ABILITY AND STABILITY, ACCURACY HITACHI, LTD. (JP) 2001-11-20 US disclosed
US-6174646-B1 IMAGEWISE HEATING OR EXPOSING IMAGE FORMING MATERIAL TO LASER WHEREIN IMAGE FORMING MATERIAL COMPRISES SUPPORT HAVING RADIATION SENSITIVE LAYER CONTAINING DYE, AN ACID GENERATING COMPOUND CAPABLE OF GENERATING ACID ON IRRADIATION KONICA CORPORATION (JP) 2001-01-16 US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed
JP-H07159992-A PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD HITACHI LTD 1995-06-23 JP disclosed
EP-0620500-A2 Resist and pattern formation using the same HITACHI, LTD. (JP) 1994-10-19 EP disclosed