SCHEMBL6543394

SCHEMBL6543394

COc1cc2cccc(C(=O)CBr)c2cc1OC

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGDS O60760 1/20 0.57
PTPN1 P18031 1/20 0.57
ALDH1A1 P00352 3/20 0.54
KDM4E B2RXH2 2/20 0.54
HPGD P15428 2/20 0.54
HSD17B10 Q99714 1/20 0.54
CASP3 P42574 2/20 0.42
SENP6 Q9GZR1 2/20 0.42
APAF1 O14727 1/20 0.42
TDP2 O95551 1/20 0.42
NSD2 O96028 1/20 0.42
PPP1CA P62136 1/20 0.42
SENP8 Q96LD8 1/20 0.42
SENP7 Q9BQF6 1/20 0.42
SAE1 Q9UBE0 1/20 0.42
UBA2 Q9UBT2 1/20 0.42
AURKA O14965 4/20 0.40
MET P08581 4/20 0.40
KDR P35968 4/20 0.40
TEK Q02763 4/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11587837 0.84 PTPN1 (0.72) HPGDSPTPN1ALDH1A1KDM4EHPGD
SCHEMBL11589676 0.82 PTPN1 (0.70) HPGDSPTPN1ALDH1A1KDM4EHPGD
SCHEMBL11267179 0.81 KDM4E (0.55) ALDH1A1KDM4EHPGDHSD17B10AURKA
SCHEMBL11281108 0.81 ALDH1A1 (0.69) PTPN1ALDH1A1KDM4EHPGDHSD17B10
SCHEMBL571371 0.81 PTPN1 (0.59) HPGDSPTPN1AURKAMETKDR
SCHEMBL11271946 0.80 KDM4E (0.54) ALDH1A1KDM4EHPGDHSD17B10CASP3
SCHEMBL31605291 0.80 ALDH1A1 (0.70) HPGDSPTPN1ALDH1A1KDM4EHPGD
SCHEMBL4302876 0.80 ALDH1A1 (0.70) HPGDSPTPN1ALDH1A1KDM4EHPGD
SCHEMBL11272881 0.80 ALDH1A1 (0.62) ALDH1A1KDM4EHPGDHSD17B10AURKA
SCHEMBL31605294 0.80 ALDH1A1 (0.70) HPGDSPTPN1ALDH1A1KDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0620500-A2 Resist and pattern formation using the same HITACHI, LTD. (JP) 1994-10-19 EP claimed
JP-7159992-A None JP disclosed
US-6790564-B2 FOR USE IN PRODUCING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICES; EFFICIENCY RENESAS TECHNOLOGY CORPORATION (JP) 2004-09-14 US disclosed
EP-0911153-B1 Image forming method KONISHIROKU PHOTO IND (JP) 2003-12-10 EP disclosed
US-20020086222-A1 Photomask and manufacturing method of an electronic device therewith RENESAS ELECTRONICS CORPORATION (JP) 2002-07-04 US disclosed
US-6174646-B1 IMAGEWISE HEATING OR EXPOSING IMAGE FORMING MATERIAL TO LASER WHEREIN IMAGE FORMING MATERIAL COMPRISES SUPPORT HAVING RADIATION SENSITIVE LAYER CONTAINING DYE, AN ACID GENERATING COMPOUND CAPABLE OF GENERATING ACID ON IRRADIATION KONICA CORPORATION (JP) 2001-01-16 US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed
JP-H07159992-A PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD HITACHI LTD 1995-06-23 JP disclosed
EP-0620500-A2 Resist and pattern formation using the same HITACHI, LTD. (JP) 1994-10-19 EP disclosed
US-4327022-A Heterocyclic alkyl naphthols STERLING DRUG INC. (US) 1982-04-27 US disclosed
US-4169108-A 5(OR 6)-[(Substituted-amino)alkyl]-2,3-naphthalenediols STERLING DRUG INC. (US) 1979-09-25 US disclosed