SCHEMBL6545450

SCHEMBL6545450

C=C(C)C(CC)CCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19457221 0.88 CHRM1 (0.46)
SCHEMBL2889274 0.84 CA2 (0.54)
Hydrochloric Acid SCHEMBL28460288 0.83 CHRM1 (0.42)
SCHEMBL677150 0.82
SCHEMBL9388926 0.81
SCHEMBL28142753 0.80 CA2 (0.45)
SCHEMBL11973540 0.80 CA2 (0.45)
SCHEMBL11973373 0.80 CA2 (0.45)
SCHEMBL21019854 0.79 CA2 (0.43)
SCHEMBL19956615 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104204960-B Electrostatic image developing toner, image forming apparatus, image forming method and cartridge processing 株式会社理光 2018-05-25 CN disclosed
US-9691993-B2 Organic electroluminescent materials and devices UNIVERSAL DISPLAY CORPORATION (US) 2017-06-27 US disclosed
EP-1057803-B1 Process for producing an alcohol or an aldehyde KYOWA YUKA KK (JP) 2004-01-21 EP disclosed
US-6365783-B1 REACTING MONOOLEFINS WITH CARBON MONOXIDE AND HYDROGEN IN PRESENCE OF COBALT CARBONYL CATALYST KYOWA YUKA CO., LTD. (JP) 2002-04-02 US disclosed
EP-1057803-A1 Process for producing an alcohol or an aldehyde Kyowa Yuka Co., Ltd. (JP) 2000-12-06 EP disclosed
US-4338469-A PAINT ADDITIVE SUNTECH, INC. (US) 1982-07-06 US disclosed
US-4292219-A Latex-base paint containing 2-methoxy-2-phenyl propane or 8-methoxy-p-menthane SUNTECH, INC. (PA) 1981-09-29 US disclosed