Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 1/20 | 0.60 |
| ▸ | MAOB | P27338 | 1/20 | 0.47 |
| ▸ | CYP11B1 | P15538 | 3/20 | 0.44 |
| ▸ | CYP11B2 | P19099 | 3/20 | 0.44 |
| ▸ | APP | P05067 | 2/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | NPC1 | O15118 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | NSD2 | O96028 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | IDO1 | P14902 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | ABCB1 | P08183 | 1/20 | 0.43 |
| ▸ | SLC5A1 | P13866 | 1/20 | 0.43 |
| ▸ | SLC5A2 | P31639 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28068788 | 0.93 | LTA4H (0.53) | LTA4HMAOBCYP11B1CYP11B2APP | |
| SCHEMBL27683103 | 0.92 | LTA4H (0.51) | LTA4HMAOBCYP11B1CYP11B2APP | |
| SCHEMBL28251912 | 0.86 | LTA4H (0.72) | LTA4HMAOBCYP11B1CYP11B2L3MBTL1 | |
| Trifluoromethanesulfonic Acid SCHEMBL27570406 | 0.84 | LTA4H (0.44) | LTA4HMAOBL3MBTL1MEN1NSD2 | |
| SCHEMBL2027109 | 0.84 | LTA4H (0.69) | LTA4HMAOBCYP11B1CYP11B2L3MBTL1 | |
| SCHEMBL9232175 | 0.81 | LTA4H (0.60) | LTA4HMAOBCYP11B1CYP11B2L3MBTL1 | |
| SCHEMBL28131751 | 0.81 | LTA4H (0.64) | LTA4HMAOBCYP11B1CYP11B2L3MBTL1 | |
| SCHEMBL26949212 | 0.81 | LTA4H (0.64) | LTA4HMAOBCYP11B1CYP11B2L3MBTL1 | |
| SCHEMBL11289347 | 0.79 | LTA4H (0.62) | LTA4HMAOBCYP11B1CYP11B2L3MBTL1 | |
| SCHEMBL7282070 | 0.79 | LTA4H (0.62) | LTA4HMAOBL3MBTL1TDP1IDO1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110256655-A | A kind of tannic acid Quito official's epoxy resin and preparation method thereof and preparation can liquid alkali developing negative photoresist | 苏州瑞红电子化学品有限公司 | 2019-09-20 | — | — | CN | claimed |
| CN-108084331-B | A kind of biology base film-forming resin and its photoresist of preparation | 江南大学 | 2019-08-16 | — | — | CN | claimed |
| CN-105566552-B | A kind of acrylate copolymer and its manufactured 248nm photoetching compositions | 江南大学 | 2019-05-17 | — | — | CN | claimed |
| CN-108084331-A | A kind of biology base film-forming resin and its photoresist of preparation | 江南大学 | 2018-05-29 | — | — | CN | claimed |
| CN-107325218-A | A kind of fluorostyrenic monomers, fluorinated copolymer and the application in 248nm deep ultraviolet light-sensitive lacquers | 苏州瑞红电子化学品有限公司 | 2017-11-07 | — | — | CN | claimed |
| CN-106565787-A | Branching macromolecule with cyclotriphosphazene as structural framework and photoresist composition prepared through branching macromolecule | 江南大学 | 2017-04-19 | — | — | CN | claimed |
| CN-110256655-A | A kind of tannic acid Quito official's epoxy resin and preparation method thereof and preparation can liquid alkali developing negative photoresist | 苏州瑞红电子化学品有限公司 | 2019-09-20 | — | — | CN | disclosed |
| CN-108084331-B | A kind of biology base film-forming resin and its photoresist of preparation | 江南大学 | 2019-08-16 | — | — | CN | disclosed |
| CN-105566552-B | A kind of acrylate copolymer and its manufactured 248nm photoetching compositions | 江南大学 | 2019-05-17 | — | — | CN | disclosed |
| CN-108084331-A | A kind of biology base film-forming resin and its photoresist of preparation | 江南大学 | 2018-05-29 | — | — | CN | disclosed |
| CN-106565787-A | Branching macromolecule with cyclotriphosphazene as structural framework and photoresist composition prepared through branching macromolecule | 江南大学 | 2017-04-19 | — | — | CN | disclosed |
| CN-102216400-B | Radiation curable coating materials | BASF SE | 2013-12-18 | — | — | CN | disclosed |
| CN-102216400-A | Radiation curable coating materials | BASF SE | 2011-10-12 | — | — | CN | disclosed |
| EP-1002817-B1 | Photocurable composition | SHOWA DENKO KK (JP) | 2004-04-28 | — | — | EP | disclosed |
| EP-0915136-B1 | Photocurable paint composition for road markings | SHOWA DENKO KK (JP) | 2004-01-21 | — | — | EP | disclosed |
| US-6486225-B1 | Photocurable composition | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2002-11-26 | — | — | US | disclosed |
| US-6211260-B1 | MARKING ROADS WITH CURABLE PAINT, FILLERS, GLASS BEADS, CATIONIC DYES AND QUATERNARY ORGANIC BORATES | SHOWA DENKO K.K. (JP) | 2001-04-03 | — | — | US | disclosed |
| EP-1002817-A2 | Photocurable composition | SHOWA DENKO KABUSHIKI KAISHA (JP) | 2000-05-24 | — | — | EP | disclosed |
| CN-1245910-A | Chemical intensified positive photoresist composite | SUMITOMO CHEMICAL CO (JP) | 2000-03-01 | — | — | CN | disclosed |
| EP-0915136-A1 | Photocurable paint composition for road markings | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1999-05-12 | — | — | EP | disclosed |