Ethyl Acetate

Ethyl Acetate

SCHEMBL65476

CC(O)CO.CCOC(C)=O.CCOCC

nearest known ligand 0.58

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

SLC5A2

The experimentally established mechanism targets of Ethyl Acetate. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.58
LMNA P02545 1/20 0.58
HSD17B10 Q99714 1/20 0.58
TSHR P16473 1/20 0.48
TDP1 Q9NUW8 1/20 0.42
GAA P10253 2/20 0.34
ALOX15 P16050 1/20 0.34
MGAM O43451 1/20 0.34
SI P14410 1/20 0.34
MGAM2 Q2M2H8 1/20 0.34
SOAT1 P35610 1/20 0.34
CHRM5 P08912 2/20 0.34
CHRM1 P11229 2/20 0.34
CHRM3 P20309 2/20 0.34
PGR P06401 1/20 0.34
CHRM2 P08172 1/20 0.34
CHRM4 P08173 1/20 0.34
HTR1A P08908 1/20 0.34
CHRNB2 P17787 1/20 0.34
TBXA2R P21731 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethyl Acetate SCHEMBL28009515 0.96 ALDH1A1 (0.54) ALDH1A1LMNAHSD17B10TSHRTDP1
Ethyl Acetate SCHEMBL22207671 0.96 ALDH1A1 (0.54) ALDH1A1LMNAHSD17B10TSHRTDP1
Ethyl Acetate SCHEMBL28454300 0.94 ALDH1A1 (0.67) ALDH1A1LMNAHSD17B10TSHRTDP1
Ethyl Acetate SCHEMBL28957278 0.94 ALDH1A1 (0.67) ALDH1A1LMNAHSD17B10TSHRTDP1
Ethyl Acetate SCHEMBL564571 0.94 ALDH1A1 (0.67) ALDH1A1LMNAHSD17B10TSHRTDP1
Ethyl Acetate SCHEMBL4580290 0.93 ALDH1A1 (0.50) ALDH1A1LMNAHSD17B10TSHRTDP1
Ethyl Acetate SCHEMBL7707782 0.91 ALDH1A1 (0.64) ALDH1A1LMNAHSD17B10TSHRTDP1
Ethyl Acetate SCHEMBL4578201 0.89 ALDH1A1 (0.47) ALDH1A1LMNAHSD17B10TSHRTDP1
Ethyl Acetate SCHEMBL28543086 0.89 ALDH1A1 (0.61) ALDH1A1LMNAHSD17B10TSHRTDP1
Ethyl Acetate SCHEMBL9472667 0.89 ALDH1A1 (0.67) ALDH1A1LMNAHSD17B10TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 23503 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122095033-A Formulations 2026-05-26 CN claimed
WO-2026104328-A1 FORMULATION MERCK PATENT GMBH (DE) 2026-05-21 WO claimed
CN-122037616-A Pigment red 254 kneading inducer and application thereof 重庆安尚科技有限公司 2026-05-15 CN claimed
EP-4072992-B1 COMPOSITION SAMSUNG ELECTRONICS CO LTD (KR) 2026-04-08 EP claimed
US-20260083659-A1 SUNSCREEN COMPOSITIONS AND METHODS OF USE MARY KAY INC. (US) 2026-03-26 US claimed
US-20260044072-A1 ZN-BASED ORGANICALLY-COORDINATED NANOPARTICLES, PHOTORESIST COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF BEIJING VFORTUNE NEW ENERGY POWER TECH DEVELOPMENT CO LTD (CN) 2026-02-12 US claimed
US-20260042784-A1 ZN-BASED ORGANIC COORDINATION NANOPARTICLE AND PREPARATION METHODTHEREFOR, PHOTORESIST COMPOSITION CONTAINING SAME, AND USE THEREOF BEIJING VFORTUNE NEW ENERGY POWER TECH DEVELOPMENT CO LTD (CN) 2026-02-12 US claimed
US-20260042783-A1 ZN-BASED ORGANIC COORDINATION NANOPARTICLES AND PREPARATION METHOD THEREFOR, PHOTORESIST COMPOSITION, AND USE THEREOF UNIV TSINGHUA (CN) 2026-02-12 US claimed
US-20260016747-A1 RESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-01-15 US claimed
US-12441908-B2 Multilayer paint protection film for vehicle AMTE CO., LTD (KR) 2025-10-14 US claimed
US-5693749-A DEIONIZATION VIA UNION AND CATION EXCHANGE RESINS, DESOLVENTIZING AND DEHYDRATION VIA DISTILLATION TO OBTAIN A HEAT RESISTANT NOVOLAC RESIN FORMED FROM M-CRESOL, P-CRESOL AND TRIOXANE HOECHST CELANESE CORPORATION (US) 1997-12-02 US claimed
US-5679496-A CONTAINING SULFONIUM SALT HAVING TERT-BUTOXYCARBONYLMETHOXY GROUP(S) AS ACID LABILE GROUPS; SENSITIVITY, RESOLUTION, ETCH AND HEAT RESISTANCE SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-10-21 US claimed
US-5629134-A SOLVENT, ALKALI SOLUBLE RESIN, ACID GENERATOR, PYRIDINE SALT SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-05-13 US claimed
WO-1997011100-A1 FRACTIONATION OF PHENOL FORMALDEHYDE CONDENSATE AND PHOTORESIST COMPOSITIONS PRODUCED THEREFROM CLARIANT INTERNATIONAL LTD. (CH) 1997-03-27 WO claimed
WO-1997011101-A1 FRACTIONATION OF PHENOL FORMALDEHYDE CONDENSATE AND PHOTORESIST COMPOSITIONS PRODUCED THEREFROM CLARIANT INTERNATIONAL, LTD. (CH) 1997-03-27 WO claimed
EP-0745633-A2 Si containing high molecular compound and photosensitive resin composition NEC CORPORATION (JP) 1996-12-04 EP claimed
EP-0423334-B1 RESIN COMPOSITION AND PROCESS FOR FORMING TRANSPARENT THIN FILM NIPPON KAYAKU KK (JP) 1996-09-18 EP claimed
US-5180794-A Resin compositions and process for forming transparent thin films NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1993-01-19 US claimed
EP-0236497-B1 COATING COMPOSITIONS AND METHOD FOR IMPROVING THE PROPERTIES OF COATED SUBSTRATES COATINGS FOR INDUSTRY, INC. (US) 1991-07-31 EP claimed
EP-0423334-A1 RESIN COMPOSITION AND PROCESS FOR FORMING TRANSPARENT THIN FILM NIPPON KAYAKU KABUSHIKI KAISHA (JP) 1991-04-24 EP claimed