SCHEMBL6547657

SCHEMBL6547657

CCCCOc1ccc(-c2ccccc2I)cc1

nearest known ligand 0.53

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 2/20 0.53
CYP2D6 P10635 11/20 0.53
CYP2C9 P11712 8/20 0.53
CYP2C19 P33261 8/20 0.53
CYP19A1 P11511 8/20 0.53
CYP1A2 P05177 7/20 0.53
CYP3A4 P08684 8/20 0.50
RAB9A P51151 4/20 0.48
NPC1 O15118 3/20 0.48
KDM4E B2RXH2 2/20 0.48
SMN1; SMN2 Q16637 2/20 0.48
ALDH1A1 P00352 1/20 0.48
MAPT P10636 1/20 0.48
HPGD P15428 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
HSD17B10 Q99714 1/20 0.45
MAPK1 P28482 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL145007 0.95 LTA4H (0.54) LTA4HCYP2D6CYP2C9CYP2C19CYP19A1
SCHEMBL6933540 0.95 LTA4H (0.54) LTA4HCYP2D6CYP2C9CYP2C19CYP19A1
SCHEMBL7874436 0.95 LTA4H (0.54) LTA4HCYP2D6CYP2C9CYP2C19CYP19A1
SCHEMBL7874461 0.95 LTA4H (0.54) LTA4HCYP2D6CYP2C9CYP2C19CYP19A1
Hydrochloric Acid SCHEMBL3403778 0.94 LTA4H (0.53) LTA4HCYP2D6CYP2C9CYP2C19CYP19A1
SCHEMBL28493109 0.90 LTA4H (0.49) LTA4HCYP2D6CYP2C9CYP2C19CYP19A1
SCHEMBL27804520 0.90 LTA4H (0.49) LTA4HCYP2D6CYP2C9CYP2C19CYP19A1
SCHEMBL27664857 0.89 LTA4H (0.48) LTA4HCYP2D6CYP2C9CYP2C19CYP19A1
SCHEMBL27604585 0.89 LTA4H (0.48) LTA4HCYP2D6CYP2C9CYP2C19CYP19A1
Trifluoroacetic Acid SCHEMBL7584612 0.86 FFAR4 (0.52) LTA4H

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1825206-A Negative resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2006-08-30 CN disclosed
EP-1135977-B1 METHOD OF MANUFACTURING AN INTERLAYER VIA AND A LAMINATE PRECURSOR USEFUL THEREFOR HONEYWELL INT INC (US) 2004-01-28 EP disclosed
US-6368697-B1 Method of manufacturing an interlayer via and a laminate precursor useful for same HONEYWELL INTERNATIONAL INC. 2002-04-09 US disclosed
EP-0703499-B1 Top coats for shoot and run printing plates MINNESOTA MINING & MFG (US) 2002-03-20 EP disclosed
CN-1333999-A Method for producing intermediate layer channels and laminate precursors useful therefor ALLIED SIGNAL INC (US) 2002-01-30 CN disclosed
EP-1135977-A1 METHOD OF MANUFACTURING AN INTERLAYER VIA AND A LAMINATE PRECURSOR USEFUL THEREFOR AlliedSignal Inc. (US) 2001-09-26 EP disclosed
US-6255039-B1 Fabrication of high density multilayer interconnect printed circuit boards ISOLA LAMINATE SYSTEMS CORP. 2001-07-03 US disclosed
CN-1291301-A Positive active photodielectric composition EASORA LAMINATED SYSTEM CO (US) 2001-04-11 CN disclosed
US-6168898-B1 A POSITIVE ACTING, PHOTOIMAGEABLE COMPOSITION HAVING, A PHOTOACID GENERATOR CAPABLE OF GENERATING AN ACID UPON EXPOSURE TO ACTINIC RADIATION, A STYRENE-MALEIC ANHYDRIDE COPOLYMER, AN EPXOY, AND A CURING CATALYST ISOLA LAMINATE SYSTEMS CORP. 2001-01-02 US disclosed
EP-1062545-A1 POSITIVE ACTING PHOTODIELECTRIC COMPOSITION Isola Laminate Systems Corporation (US) 2000-12-27 EP disclosed
US-5153104-A Negative-acting photothermographic imaging systems comprising also a nitrate, an initiator, a leuco dye and a binder; colorfastness; clean background MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-10-06 US disclosed
EP-0500321-A1 High speed aqueous solvent developable photopolymer compositions MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-08-26 EP disclosed
WO-1992009934-A1 PHOTOSENSITIVE MATERIALS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-06-11 WO disclosed
US-5102771-A Containing photoinitiator and polymer containing alkoxyalkyl ester groups MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1992-04-07 US disclosed
EP-0462763-A1 Thermally developable light-sensitive layers containing photobleachable sensitizers MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1991-12-27 EP disclosed
EP-0302610-A2 Light sensitive element MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1989-02-08 EP disclosed
EP-0061898-B1 VISIBLE LIGHT SENSITIVE, THERMALLY DEVELOPABLE IMAGING SYSTEMS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1985-06-19 EP disclosed
US-4460677-A Visible light sensitive, thermally developable imaging systems MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1984-07-17 US disclosed
US-4386154-A ACYLATED LEUCO DYES MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1983-05-31 US disclosed
EP-0061898-A1 Visible light sensitive, thermally developable imaging systems MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1982-10-06 EP disclosed