⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL6550644 | 0.98 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL2945043 | 0.90 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6548773 | 0.87 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6727903 | 0.86 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6734483 | 0.86 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6549348 | 0.86 | — | — | |
| SCHEMBL4999205 | 0.85 | CA1 (0.33) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6731269 | 0.84 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6550368 | 0.84 | CES1 (0.33) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL6551215 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1167349-B1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2004-12-01 | — | — | EP | disclosed |
| US-20040224251-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2004-11-11 | — | — | US | disclosed |
| US-6602647-B2 | Photo acid generator with high transparency and excellent heat stability in a photoresist for lithography using far ultraviolet light, especially light of ArF excimer consists of a cyclic sulfonium compound with 2-oxo group | NEC CORPORATION (JP) | 2003-08-05 | — | — | US | disclosed |
| US-6548220-B2 | Containing acid generator | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-04-15 | — | — | US | disclosed |
| US-20020045122-A1 | Sulfonium salt compound and resist composition and pattern forming method using the same | NEC CORPORATION | 2002-04-18 | — | — | US | disclosed |
| EP-1167349-A1 | Chemical amplifying type positive resist composition and sulfonium salt | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-02 | — | — | EP | disclosed |
| EP-1113334-A1 | Sulfonium salt compound, resist composition comprising the same and pattern forming method using the composition | NEC CORPORATION (JP) | 2001-07-04 | — | — | EP | disclosed |