Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6550368

CCCCC(=O)C[S+]1CCCC1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.33

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Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CES1 P23141 7/20 0.33
KCNH2 Q12809 6/20 0.33
CES2 O00748 3/20 0.33
FAAH O00519 8/20 0.32
MEN1 O00255 1/20 0.31
CYP1A2 P05177 1/20 0.31
KMT2A Q03164 1/20 0.31
HSD17B10 Q99714 1/20 0.31
CA1 P00915 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6550468 0.99 KCNH2 (0.33) CES1KCNH2CES2FAAHMEN1
Trifluoromethanesulfonic Acid SCHEMBL6549419 0.96 FAAH (0.38) CES1KCNH2CES2FAAHMEN1
Trifluoromethanesulfonic Acid SCHEMBL6550326 0.94 FAAH (0.37) CES1KCNH2CES2FAAHMEN1
Trifluoromethanesulfonic Acid SCHEMBL6551077 0.94 CES1 (0.39) CES1KCNH2CES2FAAHMEN1
Trifluoromethanesulfonic Acid SCHEMBL6550569 0.93 CES1 (0.38) CES1KCNH2CES2FAAHMEN1
Trifluoromethanesulfonic Acid SCHEMBL6548773 0.91
Trifluoromethanesulfonic Acid SCHEMBL6549348 0.90
Trifluoromethanesulfonic Acid SCHEMBL6728698 0.87 KCNH2 (0.32) CES1KCNH2CES2
Trifluoromethanesulfonic Acid SCHEMBL6723127 0.87 KCNH2 (0.32) CES1KCNH2CES2
SCHEMBL6551161 0.87 CA1 (0.30) CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6743885-B2 MIXTURE OF POLYSILSESQUIOXANE AND ACID GENERATOR SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-06-01 US disclosed
US-20030092854-A1 Resin composition for intermediate layer of three-layer resist SUMITOMO CHEMICAL COMPANY, LIMITED 2003-05-15 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed