SCHEMBL6549243

SCHEMBL6549243

CCCCCCC(=O)C[S+](C)C.CCCCS(=O)(=O)[O-]

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 4/20 0.42
CES1 P23141 4/20 0.42
HAO1 Q9UJM8 1/20 0.42
KMT2A Q03164 2/20 0.42
MAPT P10636 1/20 0.42
EPHX2 P34913 1/20 0.40
GPR84 Q9NQS5 7/20 0.37
PPARG P37231 6/20 0.37
PPARD Q03181 6/20 0.37
PPARA Q07869 6/20 0.37
HDAC11 Q96DB2 5/20 0.37
TSHR P16473 4/20 0.37
ALDH1A1 P00352 2/20 0.37
TLR2 O60603 2/20 0.37
TDP1 Q9NUW8 2/20 0.37
FABP4 P15090 2/20 0.37
PTPN1 P18031 2/20 0.37
SLC22A6 Q4U2R8 1/20 0.37
SLC22A8 Q8TCC7 1/20 0.37
MEN1 O00255 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6551502 0.98 CES2 (0.41) CES2CES1HAO1KMT2AMAPT
SCHEMBL6549443 0.93 CES1 (0.39) CES2CES1HAO1KMT2AMAPT
SCHEMBL6548835 0.90 EPHX2 (0.36) CES2CES1HAO1KMT2AEPHX2
SCHEMBL6549340 0.86 CES2 (0.41) CES2CES1HAO1KMT2AMAPT
SCHEMBL6550576 0.85 HAO1 (0.38) CES2CES1HAO1KMT2AMAPT
SCHEMBL6550608 0.85 EPHX2 (0.37) CES2CES1MAPTEPHX2TSHR
SCHEMBL6549395 0.84 CES2 (0.40) CES2CES1HAO1KMT2AMAPT
SCHEMBL6734002 0.84 KMT2A (0.56) CES2CES1HAO1KMT2AMAPT
SCHEMBL6549356 0.84 CES2 (0.39) CES2CES1HAO1KMT2AMAPT
SCHEMBL6551066 0.83 HAO1 (0.39) CES2CES1HAO1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed