Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6549328

CC[S+](CC)CC(=O)C(C)(C)C.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6549876 0.84 CA1 (0.35)
Trifluoromethanesulfonic Acid SCHEMBL6550958 0.83 KCNH2 (0.35)
SCHEMBL6550661 0.83 CA2 (0.37)
SCHEMBL6727586 0.82 KMT2A (0.31)
Trifluoromethanesulfonic Acid SCHEMBL6550544 0.81 KCNH2 (0.30)
Trifluoromethanesulfonic Acid SCHEMBL6549608 0.81 KCNH2 (0.30)
Trifluoromethanesulfonic Acid SCHEMBL6550653 0.80 TDP1 (0.32)
SCHEMBL7531121 0.79
Trifluoromethanesulfonic Acid SCHEMBL7160636 0.79
SCHEMBL6550441 0.78 EPHX2 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed