Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6549558

C[S+](C)CC(=O)C1CCCCC1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.34

Full drug profile on Sugi Atlas →

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.31
CES1 P23141 1/20 0.31
TSHR P16473 2/20 0.31
RECQL P46063 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.30
HSD17B10 Q99714 1/20 0.30
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6551131 0.98 SMN1; SMN2 (0.31) SMN1; SMN2HSD17B10
Trifluoromethanesulfonic Acid SCHEMBL7159777 0.87
Trifluoromethanesulfonic Acid SCHEMBL7161499 0.87
Trifluoromethanesulfonic Acid SCHEMBL7159616 0.87 SMN1; SMN2 (0.31) SMN1; SMN2HSD17B10LMNA
SCHEMBL6549979 0.86 CA1 (0.32)
SCHEMBL6551497 0.85 CA2 (0.33)
Trifluoromethanesulfonic Acid SCHEMBL6550701 0.85 TSHR (0.32) TSHRL3MBTL1
Trifluoromethanesulfonic Acid SCHEMBL7157320 0.85 SMN1; SMN2 (0.32) SMN1; SMN2HSD17B10
SCHEMBL6549510 0.84 CA2 (0.33)
Trifluoromethanesulfonic Acid SCHEMBL6549400 0.84

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed