SCHEMBL6549652

SCHEMBL6549652

CCCCS(=O)(=O)[O-].C[S+](CC(=O)C(C)(C)C)C(C)(C)C

nearest known ligand 0.34

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.34
BBOX1 O75936 2/20 0.32
FAAH O00519 3/20 0.31
CES2 O00748 2/20 0.31
CES1 P23141 1/20 0.31
MEN1 O00255 1/20 0.31
LMNA P02545 1/20 0.31
POLB P06746 1/20 0.31
GRK2 P25098 1/20 0.31
KMT2A Q03164 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6550593 0.87 EPHX2 (0.35) EPHX2BBOX1FAAHCES2CES1
SCHEMBL6549744 0.86 EPHX2 (0.35) EPHX2BBOX1MEN1LMNAPOLB
SCHEMBL6551035 0.84 EPHX2 (0.34) EPHX2BBOX1MEN1LMNAPOLB
SCHEMBL6550895 0.83 EPHX2 (0.33) EPHX2BBOX1CES2CES1MEN1
SCHEMBL6549512 0.83 CES1 (0.34) EPHX2BBOX1CES2CES1MEN1
SCHEMBL6550441 0.83 EPHX2 (0.35) EPHX2BBOX1FAAHCES2CES1
SCHEMBL6548750 0.82 CES1 (0.36) EPHX2FAAHCES2CES1MEN1
SCHEMBL6550467 0.82 EPHX2 (0.33) EPHX2BBOX1MEN1LMNAPOLB
SCHEMBL6550308 0.81 EPHX2 (0.34) EPHX2BBOX1FAAHCES2CES1
SCHEMBL6550576 0.81 HAO1 (0.38) EPHX2FAAHCES2CES1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed