SCHEMBL6549865

SCHEMBL6549865

CCCCS(=O)(=O)[O-].CCCC[S+](CCCC)CC(=O)C1CCCC1

nearest known ligand 0.33

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.33
EPHX2 P34913 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6551034 0.99 NAAA (0.35) NAAAEPHX2
SCHEMBL6550516 0.90 NAAA (0.34) NAAAEPHX2
SCHEMBL6549501 0.89 NAAA (0.36) NAAAEPHX2
SCHEMBL6727749 0.87 NAAA (0.41) NAAAEPHX2
SCHEMBL6550460 0.86 NAAA (0.35) NAAAEPHX2
SCHEMBL6731775 0.85 NAAA (0.44) NAAAEPHX2
Trifluoromethanesulfonic Acid SCHEMBL6549578 0.85 NAAA (0.33) NAAA
SCHEMBL6550966 0.84 NAAA (0.37) NAAAEPHX2
Trifluoromethanesulfonic Acid SCHEMBL6549828 0.84 NAAA (0.35) NAAA
SCHEMBL6551051 0.82 NAAA (0.33) NAAAEPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed