Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6550322

CCCC[S+](CCCC)CC(=O)CC.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.35

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Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 7/20 0.35
FAAH O00519 10/20 0.32
CES1 P23141 5/20 0.32
CES2 O00748 3/20 0.32
EPHX1 P07099 1/20 0.31
MEN1 O00255 1/20 0.30
CYP1A2 P05177 1/20 0.30
KMT2A Q03164 1/20 0.30
HSD17B10 Q99714 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL2922536 0.93 KCNH2 (0.37) KCNH2FAAHCES1CES2EPHX1
Trifluoromethanesulfonic Acid SCHEMBL6550755 0.89 CES1 (0.35) KCNH2FAAHCES1CES2MEN1
Trifluoromethanesulfonic Acid SCHEMBL6551258 0.89 KCNH2 (0.35) KCNH2FAAHCES1CES2MEN1
Trifluoromethanesulfonic Acid SCHEMBL6549514 0.88 FAAH (0.40) KCNH2FAAHCES1CES2MEN1
Trifluoromethanesulfonic Acid SCHEMBL6551136 0.86 CES1 (0.41) KCNH2FAAHCES1CES2MEN1
SCHEMBL6549538 0.86 CA1 (0.33)
Trifluoromethanesulfonic Acid SCHEMBL6550723 0.85 KCNH2 (0.36) KCNH2FAAHCES1CES2EPHX1
SCHEMBL6549659 0.84 CA1 (0.34)
Trifluoromethanesulfonic Acid SCHEMBL6550653 0.83 TDP1 (0.32)
Trifluoromethanesulfonic Acid SCHEMBL6550958 0.83 KCNH2 (0.35) KCNH2FAAHCES1CES2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed