SCHEMBL6550781

SCHEMBL6550781

CC(C)(C)C(=O)C[S+]1CCCCC1.CCCCS(=O)(=O)[O-]

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6550669 0.99 EPHX2 (0.33) EPHX2
SCHEMBL7164829 0.86 EPHX2 (0.33) EPHX2
SCHEMBL7162225 0.86 EPHX2 (0.31) EPHX2
SCHEMBL7157253 0.85 EPHX2 (0.30) EPHX2
SCHEMBL6550831 0.84 EPHX2 (0.33) EPHX2
SCHEMBL6549448 0.84 BBOX1 (0.34) EPHX2
SCHEMBL6550943 0.82 EPHX2 (0.33) EPHX2
SCHEMBL6549269 0.82 EPHX2 (0.33) EPHX2
SCHEMBL6550561 0.82 BBOX1 (0.35) EPHX2
SCHEMBL7164837 0.81 EPHX2 (0.37) EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed