SCHEMBL6550836

SCHEMBL6550836

CCC(=O)C[S+]1CCCC(C)C1.CCCCS(=O)(=O)[O-]

nearest known ligand 0.30

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.30
POLB P06746 1/20 0.30
MAPT P10636 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6549273 0.92 EPHX2 (0.31)
SCHEMBL6550551 0.85 EPHX2 (0.34) POLBMAPT
SCHEMBL6550943 0.84 EPHX2 (0.33) POLBMAPT
Trifluoromethanesulfonic Acid SCHEMBL6551215 0.82
SCHEMBL6550786 0.76
SCHEMBL7159620 0.76 EPHX2 (0.35)
SCHEMBL7159409 0.76 EPHX2 (0.32) POLB
SCHEMBL6550876 0.76
SCHEMBL6550408 0.75 CES1 (0.34) POLBMAPT
SCHEMBL6548781 0.75 EPHX2 (0.33) POLBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed