SCHEMBL6548781

SCHEMBL6548781

CCCC(=O)C[S+]1CCCC1.CCCCS(=O)(=O)[O-]

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.33
BBOX1 O75936 2/20 0.31
CES2 O00748 1/20 0.31
CES1 P23141 1/20 0.31
NPC1 O15118 1/20 0.30
S1PR2 O95136 1/20 0.30
S1PR4 O95977 1/20 0.30
ALDH1A1 P00352 1/20 0.30
LMNA P02545 1/20 0.30
TP53 P04637 1/20 0.30
POLB P06746 1/20 0.30
MAPT P10636 1/20 0.30
HPGD P15428 1/20 0.30
XBP1 P17861 1/20 0.30
S1PR1 P21453 1/20 0.30
MAPK1 P28482 1/20 0.30
AGTR1 P30556 1/20 0.30
HTT P42858 1/20 0.30
RAB9A P51151 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6551406 0.98 EPHX2 (0.33) EPHX2BBOX1
SCHEMBL6550408 0.94 CES1 (0.34) EPHX2BBOX1CES2CES1NPC1
SCHEMBL6551534 0.93 CES1 (0.33) EPHX2BBOX1CES2CES1
SCHEMBL6549622 0.93 CES2 (0.36) EPHX2CES2CES1ALDH1A1MAPT
SCHEMBL6551036 0.91 HAO1 (0.38) EPHX2CES2CES1ALDH1A1MAPT
SCHEMBL6550637 0.91 CES2 (0.35) EPHX2CES2CES1ALDH1A1MAPT
SCHEMBL6550505 0.90 HAO1 (0.37) EPHX2CES2CES1ALDH1A1MAPT
SCHEMBL6550551 0.89 EPHX2 (0.34) EPHX2BBOX1NPC1S1PR2S1PR4
SCHEMBL6550943 0.88 EPHX2 (0.33) EPHX2BBOX1NPC1S1PR2S1PR4
SCHEMBL7158447 0.87 EPHX2 (0.32) EPHX2LMNAPOLBSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed