SCHEMBL6550865

SCHEMBL6550865

N=NC1c2ccccc2-c2ccccc21

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR3 P46089 2/20 0.41
HTR2A P28223 2/20 0.41
HDAC3 O15379 1/20 0.40
HDAC4 P56524 1/20 0.40
HDAC7 Q8WUI4 1/20 0.40
HDAC8 Q9BY41 1/20 0.40
HDAC6 Q9UBN7 1/20 0.40
HDAC9 Q9UKV0 1/20 0.40
HDAC5 Q9UQL6 1/20 0.40
NCOR2 Q9Y618 1/20 0.40
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
POLB P06746 2/20 0.34
CYP1A2 P05177 1/20 0.34
CYP2D6 P10635 1/20 0.34
ACHE P22303 3/20 0.33
BCHE P06276 2/20 0.33
ALDH1A1 P00352 1/20 0.33
CHRM2 P08172 1/20 0.33
HTR1A P08908 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL403940 0.82 HDAC3 (0.31) GPR3HTR2AHDAC3HDAC4HDAC7
SCHEMBL70001 0.78 GPR3 (0.44) GPR3HTR2AHDAC3HDAC4HDAC7
SCHEMBL25434268 0.75
SCHEMBL13185884 0.74 GPR3 (0.41) GPR3HTR2AHDAC3HDAC4HDAC7
SCHEMBL8458737 0.74 GPR3 (0.41) GPR3HTR2AHDAC3HDAC4HDAC7
SCHEMBL68634 0.70 GPR3 (0.38) GPR3HTR2AHDAC3HDAC4HDAC7
SCHEMBL221399 0.69 GPR3 (0.46) GPR3HTR2AHDAC3HDAC4HDAC7
SCHEMBL4698772 0.69 GPR3 (0.37) GPR3HTR2AHDAC3HDAC4HDAC7
SCHEMBL3837050 0.69 GPR3 (0.37) GPR3HTR2AHDAC3HDAC4HDAC7
SCHEMBL27804939 0.69 GPR3 (0.37) GPR3HTR2AHDAC3HDAC4HDAC7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0789279-B2 Polymer and resist material WAKO PURE CHEM IND LTD (JP) 2004-12-08 EP disclosed
CN-1145078-C Polymer and resist material ������ҩ��ҵ��ʽ���� 2004-04-07 CN disclosed
EP-0789279-B1 Polymer and resist material WAKO PURE CHEM IND LTD (JP) 2001-03-21 EP disclosed
US-6033826-A POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2000-03-07 US disclosed
CN-1159453-A Polymer and resist material WAKO PURE CHEM IND LTD (JP) 1997-09-17 CN disclosed
EP-0789279-A1 Polymer and resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-08-13 EP disclosed