SCHEMBL6551099

SCHEMBL6551099

CC(=O)CS(C)(C)OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CA2 P00918 13/20 0.36
CA1 P00915 12/20 0.36
MMP1 P03956 6/20 0.35
MMP2 P08253 6/20 0.35
MMP9 P14780 6/20 0.35
MMP8 P22894 6/20 0.35
MMP13 P45452 6/20 0.35
F2 P00734 4/20 0.35
PRSS1 P07477 4/20 0.35
PRSS2 P07478 4/20 0.35
PRSS3 P35030 4/20 0.35
KDM4E B2RXH2 1/20 0.30
POLB P06746 1/20 0.30
MAPT P10636 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6548784 0.98 CA2 (0.38) CA2CA1MMP1MMP2MMP9
SCHEMBL6728068 0.84 CA2 (0.33) CA2CA1MMP1MMP2MMP9
SCHEMBL6551530 0.84 CA2 (0.33) CA2CA1MMP1MMP2MMP9
SCHEMBL6548705 0.83 CA2 (0.37) CA2CA1MMP1MMP2MMP9
SCHEMBL6549407 0.83 CA2 (0.35) CA2CA1MMP1MMP2MMP9
SCHEMBL6726302 0.83 CA2 (0.35) CA2CA1MMP1MMP2MMP9
SCHEMBL6550717 0.82 CA2 (0.34) CA2CA1MMP1MMP2MMP9
SCHEMBL6550834 0.81 CA1 (0.32) CA2CA1MMP1MMP2MMP9
SCHEMBL6549485 0.81 CA2 (0.36) CA2CA1MMP1MMP2MMP9
SCHEMBL6548787 0.81 CA2 (0.36) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-20040224251-A1 Positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2004-11-11 US disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed