SCHEMBL6551109

SCHEMBL6551109

CC(=O)C[S+](C(C)C)C(C)C.CCCCS(=O)(=O)[O-]

nearest known ligand 0.35

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 2/20 0.35
BBOX1 O75936 2/20 0.33
CA1 P00915 2/20 0.31
TP53 P04637 2/20 0.31
TSHR P16473 2/20 0.31
MAPK1 P28482 2/20 0.31
CES1 P23141 1/20 0.31
GMNN O75496 1/20 0.31
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
THPO P40225 1/20 0.31
HBB P68871 1/20 0.31
PMP22 Q01453 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
RECQL P46063 2/20 0.30
GLA P06280 1/20 0.30
HPGD P15428 1/20 0.30
BLM P54132 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6550446 0.85 EPHX2 (0.35) EPHX2BBOX1CA1
SCHEMBL6551001 0.85 EPHX2 (0.35) EPHX2BBOX1CA1
SCHEMBL6548654 0.84 EPHX2 (0.38) EPHX2BBOX1TP53TSHRMAPK1
SCHEMBL6549199 0.84 EPHX2 (0.34) EPHX2BBOX1CES1LMNA
SCHEMBL6551149 0.84 CES1 (0.35) EPHX2BBOX1CA1CES1LMNA
SCHEMBL6550513 0.83 EPHX2 (0.33) EPHX2BBOX1CES1LMNA
SCHEMBL6549623 0.83 CES2 (0.37) EPHX2MAPK1CES1LMNA
SCHEMBL6551066 0.81 HAO1 (0.39) EPHX2TSHRMAPK1CES1ALDH1A1
SCHEMBL6549430 0.79 EPHX2 (0.37) EPHX2BBOX1TP53TSHRMAPK1
SCHEMBL6549744 0.79 EPHX2 (0.35) EPHX2BBOX1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed