SCHEMBL6551677

SCHEMBL6551677

C=C(C)C(=O)OC.COC(C)Oc1ccc(C=CC=Cc2ccc(O)cc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
STAT3 P40763 1/20 0.46
CA12 O43570 2/20 0.41
CA1 P00915 2/20 0.41
CA2 P00918 2/20 0.41
CA7 P43166 2/20 0.41
CA9 Q16790 2/20 0.41
CA14 Q9ULX7 2/20 0.41
TYR P14679 1/20 0.41
MMP2 P08253 2/20 0.40
MMP9 P14780 2/20 0.40
MMP13 P45452 1/20 0.40
MMP1 P03956 1/20 0.40
MAPT P10636 3/20 0.39
RAB9A P51151 2/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
ALDH1A1 P00352 2/20 0.39
P4HB P07237 1/20 0.39
CALM1 P0DP23 1/20 0.39
F3 P13726 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6550872 0.90 STAT3 (0.42) STAT3CA12CA1CA2CA7
SCHEMBL7271037 0.90 STAT3 (0.42) STAT3CA12CA1CA2CA7
SCHEMBL6551626 0.88 STAT3 (0.43) STAT3CA12CA1CA2CA7
SCHEMBL8530486 0.87 ABCG2 (0.45) STAT3CA12CA1CA2CA7
SCHEMBL6550911 0.85 APP (0.53) STAT3CA12CA1CA2CA7
SCHEMBL7269899 0.85 STAT3 (0.38) STAT3CA12CA1CA2CA7
SCHEMBL6550268 0.84 STAT3 (0.39) STAT3CA12CA1CA2CA7
SCHEMBL7270957 0.82 STAT3 (0.41) STAT3CA12CA1CA2CA7
SCHEMBL2708790 0.81 ABCG2 (0.49) STAT3CA12CA1CA2CA7
SCHEMBL8517164 0.81 STAT3 (0.47) STAT3CA12CA1CA2CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0789279-B2 Polymer and resist material WAKO PURE CHEM IND LTD (JP) 2004-12-08 EP disclosed
US-6303264-B1 PROFILE OF PATTERN OF QUARTER MICRON ORDER WITHOUT CAUSING FOOTING, WHILE RETAINING HIGH RESOLUTION ABILITY AND HIGH SENSITIVITY WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 2001-10-16 US disclosed
EP-0789279-B1 Polymer and resist material WAKO PURE CHEM IND LTD (JP) 2001-03-21 EP disclosed
US-6033826-A POLYHYDROXYSTYRENE DERIVATIVE CONTAINING AN ACETAL OR KETAL GROUP WHICH CAN EASILY BE ELIMINATED IN THE PRESENCE OF AN ACID IN THE MOLECULE AND HAVING A VERY NARROW MOLECULAR WEIGHT DISTRIBUTION GIVES A RESIST MATERIAL WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2000-03-07 US disclosed
EP-0875787-A1 Method for reducing the substrate dependence of resist Wako Pure Chemical Industries, Ltd. (JP) 1998-11-04 EP disclosed
EP-0789279-A1 Polymer and resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-08-13 EP disclosed