SCHEMBL8530486

SCHEMBL8530486

C=C(C)C(=O)OC.CCCCOC(C)Oc1ccc(C=CC=Cc2ccc(O)cc2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABCG2 Q9UNQ0 3/20 0.45
STAT3 P40763 1/20 0.40
MAOB P27338 1/20 0.37
ESR1 P03372 2/20 0.36
LMNA P02545 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2D6 P10635 1/20 0.36
TSHR P16473 1/20 0.36
MAPK1 P28482 1/20 0.36
CYP2C19 P33261 1/20 0.36
NR1H2 P55055 1/20 0.36
RNASEL Q05823 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
SAE1 Q9UBE0 1/20 0.36
UBA2 Q9UBT2 1/20 0.36
MAPT P10636 2/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
P4HB P07237 1/20 0.36
CALM1 P0DP23 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6550872 0.90 STAT3 (0.42) ABCG2STAT3MAOBMAPTMEN1
SCHEMBL7271037 0.88 STAT3 (0.42) ABCG2STAT3TSHRMAPK1MAPT
SCHEMBL6551677 0.87 STAT3 (0.46) ABCG2STAT3MAPK1MAPTMEN1
SCHEMBL6550242 0.87 ABCG2 (0.50) ABCG2STAT3MAOBESR1LMNA
SCHEMBL7270957 0.81 STAT3 (0.41) ABCG2STAT3MAOBMAPTMEN1
SCHEMBL6554326 0.79 ACACB (0.34) STAT3MAPTALDH1A1TAS1R3TAS1R1
SCHEMBL3837576 0.79 STAT3 (0.37) ABCG2STAT3MAOBBACE1CA12
SCHEMBL8527423 0.79 STAT3 (0.35) ABCG2STAT3MAOBMAPTMEN1
SCHEMBL7782919 0.79 ABCG2 (0.46) ABCG2STAT3ESR1LMNACYP1A2
SCHEMBL7783181 0.78 STAT3 (0.43) ABCG2STAT3MAOBLMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0520642-B1 Resist material and pattern formation process WAKO PURE CHEM IND LTD (JP) 1998-10-28 EP disclosed
US-5670299-A COATING A PHOTORESISTS POLYMER ON A SUBSTRATE, DEVELOPMENT AND HEAT TREATMENT WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1997-09-23 US disclosed
US-5468589-A Heat resistant, photosensitive patterns WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1995-11-21 US disclosed
EP-0520642-A1 Resist material and pattern formation process WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1992-12-30 EP disclosed