Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | SCN9A | Q15858 | 2/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.35 |
| ▸ | CA12 | O43570 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | CA9 | Q16790 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.34 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL822920 | 0.91 | ALDH1A1 (0.46) | ALDH1A1MEN1KMT2ATHRBL3MBTL1 | |
| SCHEMBL14916295 | 0.90 | ALDH1A1 (0.36) | ALDH1A1MEN1KMT2ASCN9ATHRB | |
| SCHEMBL4116529 | 0.85 | ALDH1A1 (0.42) | ALDH1A1MEN1KMT2ATHRBL3MBTL1 | |
| SCHEMBL5942244 | 0.84 | ALDH1A1 (0.51) | ALDH1A1MEN1KMT2ATHRBL3MBTL1 | |
| SCHEMBL4855444 | 0.84 | ALDH1A1 (0.41) | ALDH1A1MEN1KMT2ATHRBL3MBTL1 | |
| SCHEMBL22176956 | 0.84 | ALDH1A1 (0.38) | ALDH1A1MEN1KMT2ATHRBL3MBTL1 | |
| SCHEMBL10150668 | 0.84 | ALDH1A1 (0.40) | ALDH1A1MEN1KMT2ATHRBL3MBTL1 | |
| SCHEMBL28917001 | 0.84 | ALDH1A1 (0.43) | ALDH1A1MEN1KMT2ATHRBL3MBTL1 | |
| SCHEMBL12932449 | 0.82 | ALDH1A1 (0.49) | ALDH1A1MEN1KMT2ATHRBL3MBTL1 | |
| SCHEMBL16708438 | 0.82 | ALDH1A1 (0.39) | ALDH1A1MEN1KMT2ATHRBL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-1173233-C | Chemical-amplifying type positive photoetching gel composition | 住友化学工业株式会社 | 2004-10-27 | — | — | CN | claimed |
| CN-1312489-A | Chemical-amplifying type positive photoetching gel composition | SUMITOMO CHEMICAL CO (JP) | 2001-09-12 | — | — | CN | claimed |
| CN-120762248-A | ArF photoresist composition with good adhesion and preparation process thereof | 深圳中科宏伟技术研发有限公司 | 2025-10-10 | — | — | CN | disclosed |
| US-20220119336-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-04-21 | — | — | US | disclosed |
| WO-2020027103-A1 | CURABLE RESIN COMPOSITION, POLYMER, (METH)ACRYLIC ELASTOMER AND SHEET | 大阪有機化学工業株式会社 | 2020-02-06 | — | — | WO | disclosed |
| CN-104007614-B | Resist polymer and the anti-corrosion agent composition containing the polymer | 锦湖石油化学株式会社 | 2017-09-05 | — | — | CN | disclosed |
| CN-102799068-B | Photoetching compositions | ROHM AND HAAS ELECTRONIC MATERIALS CO., LTD. (US) | 2015-10-14 | — | — | CN | disclosed |
| CN-104007614-A | Polymer for resist and resist composition comprising the same | KOREA KUMHO PETROCHEM CO LTD | 2014-08-27 | — | — | CN | disclosed |
| CN-103183613-A | Cycloaliphatic monomer, polymer comprising the Same, and photoresist composition comprising the polymer | ROHM & HAAS ELECT MAT | 2013-07-03 | — | — | CN | disclosed |
| CN-1259595-C | Chemical amplifying type positive photolithographic gelatin composition | SUMITOMO CHEMICAL CO (JP) | 2006-06-14 | — | — | CN | disclosed |
| EP-0915077-B1 | POLYMERIZABLE ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | DAICEL CHEM (JP) | 2004-11-17 | — | — | EP | disclosed |
| CN-1173233-C | Chemical-amplifying type positive photoetching gel composition | 住友化学工业株式会社 | 2004-10-27 | — | — | CN | disclosed |
| EP-1445266-A2 | Photoresist copolymer | Daicel Chemical Industries, Ltd. (JP) | 2004-08-11 | — | — | EP | disclosed |
| US-20030180662-A1 | Acid-sensitive compound and resin composition for photoresist | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-09-25 | — | — | US | disclosed |
| CN-1312489-A | Chemical-amplifying type positive photoetching gel composition | SUMITOMO CHEMICAL CO (JP) | 2001-09-12 | — | — | CN | disclosed |
| CN-1311459-A | Chemical amplifying type positive photolithographic gelatin composition | SUMITOMO CHEMICAL CO (JP) | 2001-09-05 | — | — | CN | disclosed |
| US-6235851-B1 | ESTERIFICATION OR AMIDATION REACTION OF AN ADAMANTANE DERIVATIVE; GROUP 3A METAL CATALYST | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2001-05-22 | — | — | US | disclosed |
| EP-1000924-A1 | ACID-SENSITIVE COMPOUND AND RESIN COMPOSITION FOR PHOTORESIST | Daichel Chemical Industries Ltd (JP) | 2000-05-17 | — | — | EP | disclosed |
| EP-0915077-A1 | POLYMERIZABLE ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME | Daicel Chemical Industries, Ltd. (JP) | 1999-05-12 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20220119336-A1 | COMPOUND, (CO)POLYMER, COMPOSITION, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING COMPOUND | PYM1, MMAB, MEN1 | ALDH1A1 1455/4885MEN1 3/4885KMT2A 556/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.