SCHEMBL6561397

SCHEMBL6561397

Cc1cccc(-c2ccc(-c3ccc(-c4cccc(C)c4)cc3)cc2)c1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 3/20 0.61
ENPP3 O14638 2/20 0.57
HSD17B1 P14061 2/20 0.52
HSD17B2 P37059 2/20 0.52
PGR P06401 1/20 0.52
RAB9A P51151 3/20 0.50
FNTA P49354 1/20 0.49
FNTB P49356 1/20 0.49
MAP4K4 O95819 1/20 0.48
AR P10275 1/20 0.48
FYN P06241 1/20 0.48
CLK4 Q9HAZ1 1/20 0.48
DYRK1B Q9Y463 1/20 0.48
NPC1 O15118 2/20 0.48
HPGD P15428 2/20 0.48
SMN1; SMN2 Q16637 2/20 0.48
TSHR P16473 1/20 0.48
ALDH1A1 P00352 2/20 0.48
CYP3A4 P08684 1/20 0.48
CYP2C9 P11712 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18797759 0.97 ACHE (0.65) ACHEENPP3HSD17B1HSD17B2PGR
SCHEMBL29057032 0.95 ACHE (0.55) ACHEENPP3HSD17B1HSD17B2PGR
SCHEMBL30493472 0.95 ACHE (0.55) ACHEENPP3HSD17B1HSD17B2PGR
SCHEMBL20689786 0.95 TSHR (0.55) ACHEENPP3HSD17B1HSD17B2PGR
SCHEMBL29929976 0.95 ACHE (0.55) ACHEENPP3HSD17B1HSD17B2PGR
SCHEMBL23003863 0.95 ACHE (0.55) ACHEENPP3HSD17B1HSD17B2PGR
SCHEMBL5545442 0.95 ACHE (0.55) ACHEENPP3HSD17B1HSD17B2PGR
SCHEMBL25948043 0.95 ACHE (0.55) ACHEENPP3HSD17B1HSD17B2PGR
SCHEMBL31471473 0.94 ACHE (0.69) ACHEENPP3RAB9AMAP4K4AR
SCHEMBL29373699 0.94 ACHE (0.69) ACHEENPP3RAB9AMAP4K4AR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6806019-B2 COATING SUBSTRATES WITH PHOTORESIST MIXTURES COMPRISING NOVOLAKS, ACRYLIC ESTER COPOLYMERS AND PHOTOSENSITIZERS, THEN EXPOSING THE COATINGS AND DEVELOPING, TO FORM SEMICONDUCTORS OR FLAT PANEL DISPLAYS CLARIANT FINANCE (BVI) LIMITED (VG) 2004-10-19 US disclosed
US-20040170917-A1 Method of forming thick resist pattern AZ ELECTRONIC MATERIALS USA CORP. 2004-09-02 US disclosed
EP-1400850-A1 METHOD OF FORMING THICK RESIST PATTERN CLARIANT INTERNATIONAL LTD. (CH) 2004-03-24 EP disclosed
EP-1345081-A1 HIGH-RESOLUTION PHOTOSENSITIVE RESIN COMPOSITION USABLE WITH I-LINE AND METHOD OF FORMING PATTERN Clariant International Ltd. (CH) 2003-09-17 EP disclosed
US-6537719-B1 Both a resin and a photosensitive material, wherein a fluorescent material is incorporated CLARIANT FINANCE (BVI) LIMITED (VG) 2003-03-25 US disclosed
US-20030022093-A1 High-resolution photosensitive resin composition usable with i-line and method of forming pattern AZ ELECTRONIC MATERIALS USA CORP. 2003-01-30 US disclosed
EP-1087260-A1 PHOTOSENSITIVE RESIN COMPOSITION CLARIANT INTERNATIONAL LTD. (CH) 2001-03-28 EP disclosed