⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10014691 | 0.79 | — | — | |
| SCHEMBL3482062 | 0.78 | — | — | |
| SCHEMBL1262043 | 0.74 | — | — | |
| SCHEMBL4082803 | 0.74 | — | — | |
| SCHEMBL8421919 | 0.74 | — | — | |
| SCHEMBL6561484 | 0.74 | — | — | |
| SCHEMBL4086344 | 0.74 | — | — | |
| SCHEMBL3482556 | 0.74 | TSHR (0.35) | — | |
| SCHEMBL13621384 | 0.72 | — | — | |
| SCHEMBL13621371 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250188615-A1 | Gapfill Methods and Processing Assemblies | ASM IP HOLDING B.V. (NL) | 2025-06-12 | — | — | US | claimed |
| US-20240117494-A1 | Gapfill methods and processing assemblies | ASM IP HOLDING B.V. (NL) | 2024-04-11 | — | — | US | claimed |
| US-20250188615-A1 | Gapfill Methods and Processing Assemblies | ASM IP HOLDING B.V. (NL) | 2025-06-12 | — | — | US | disclosed |
| US-12252790-B2 | Gapfill methods and processing assemblies | ASM IP HOLDING B.V. (NL) | 2025-03-18 | — | — | US | disclosed |
| CN-118843711-A | Material for gas barrier film, silicon oxide film, and method for producing silicon oxide film | 东曹株式会社 | 2024-10-25 | — | — | CN | disclosed |
| US-20240117494-A1 | Gapfill methods and processing assemblies | ASM IP HOLDING B.V. (NL) | 2024-04-11 | — | — | US | disclosed |
| CN-117355632-A | Method for producing planarizing film, material for planarizing film, and planarizing film | 东曹株式会社 | 2024-01-05 | — | — | CN | disclosed |
| US-9969850-B2 | Method for producing modified polymer, and rubber composition | TOYO TIRE & RUBBER CO., LTD. (JP) | 2018-05-15 | — | — | US | disclosed |
| EP-3245256-A1 | ORGANOPOLYSILOXANE PREPOLYMER AND CURABLE ORGANOPOLYSILOXANE COMPOSITION COMPRISING SAME | Henkel AG & Co. KGaA (DE) | 2017-11-22 | — | — | EP | disclosed |
| CN-105189565-B | Process for producing modified polymer and rubber composition | 东洋橡胶工业株式会社 | 2017-03-15 | — | — | CN | disclosed |
| WO-2016112487-A1 | ORGANOPOLYSILOXANE PREPOLYMER AND CURABLE ORGANOPOLYSILOXANE COMPOSITION COMPRISING SAME | HENKEL (CHINA) COMPANY LIMITED (CN) | 2016-07-21 | — | — | WO | disclosed |
| CN-105189565-A | Process for producing modified polymer and rubber composition | TOYO TIRE & RUBBER CO | 2015-12-23 | — | — | CN | disclosed |
| US-8791221-B2 | Addition-curable metallosiloxane compound | DAICEL CORPORATION (JP) | 2014-07-29 | — | — | US | disclosed |
| EP-2650319-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | Daicel Corporation (JP) | 2013-10-16 | — | — | EP | disclosed |
| US-20130267653-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | DAICEL CORPORATION (JP) | 2013-10-10 | — | — | US | disclosed |
| CN-103249762-A | Addition-curable metallosiloxane compound | DAICEL CORP | 2013-08-14 | — | — | CN | disclosed |
| EP-1122746-B1 | Composition for film formation and insulating film | JSR CORP (JP) | 2004-09-22 | — | — | EP | disclosed |
| US-6468589-B2 | A HEAT-CURED POLYETHER BASED ON A 9,9-BIS(P-HYDROXYPHENYL)-FLUORENE HAVING AT LEAST ONE ALKYL SUBSTITUENT AND A DIHYDROXY AROMATIC COMONOMER; LOW DIELECTRIC PROTECTIVE COATINGS; HEAT RESISTANCE; NONCRACKING | JSR CORPORATION (JP) | 2002-10-22 | — | — | US | disclosed |
| US-20010012870-A1 | Composition for film formation and insulating film | JSR CORPORATION (JP) | 2001-08-09 | — | — | US | disclosed |
| EP-1122746-A1 | Composition for film formation and insulating film | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |