⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL31152866 | 1.00 | — | — | |
| SCHEMBL120 | 1.00 | — | — | |
| Water SCHEMBL21518539 | 1.00 | — | — | |
| SCHEMBL6522063 | 1.00 | — | — | |
| SCHEMBL5199999 | 1.00 | — | — | |
| SCHEMBL122 | 1.00 | — | — | |
| SCHEMBL10454455 | 0.96 | — | — | |
| Hydrochloric Acid SCHEMBL9508595 | 0.96 | — | — | |
| Lithium SCHEMBL30850376 | 0.96 | — | — | |
| Potassium SCHEMBL31187922 | 0.96 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118302462-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2024-07-05 | — | — | CN | disclosed |
| CN-118290880-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2024-07-05 | — | — | CN | disclosed |
| CN-118234819-A | Reinforced film | 日东电工株式会社 | 2024-06-21 | — | — | CN | disclosed |
| CN-118099173-A | Solid-state imaging element, method for manufacturing solid-state imaging element, and electronic device | 爱天思株式会社 | 2024-05-28 | — | — | CN | disclosed |
| CN-118020023-A | Pellicle, exposure original plate, exposure apparatus, and method for manufacturing pellicle | 三井化学株式会社 | 2024-05-10 | — | — | CN | disclosed |
| CN-117916662-A | Pellicle, exposure original plate, exposure apparatus, and method for manufacturing pellicle | 三井化学株式会社 | 2024-04-19 | — | — | CN | disclosed |
| CN-117916335-A | Antireflection film with pressure-sensitive adhesive sheet and image display device | 日东电工株式会社 | 2024-04-19 | — | — | CN | disclosed |
| CN-117916661-A | Protective film assembly | 三井化学株式会社 | 2024-04-19 | — | — | CN | disclosed |
| CN-117897637-A | Optical laminate and image display device | 日东电工株式会社 | 2024-04-16 | — | — | CN | disclosed |
| CN-117881760-A | Pressure-sensitive adhesive composition, pressure-sensitive adhesive sheet, optical laminate, and image display device | 日东电工株式会社 | 2024-04-12 | — | — | CN | disclosed |
| CN-115397877-A | Curable resin composition, resin film, cured product, and laminate | 东洋油墨SC控股株式会社 | 2022-11-25 | — | — | CN | disclosed |
| CN-115297931-A | SMARCA degrading agents and uses thereof | 凯麦拉医疗公司 | 2022-11-04 | — | — | CN | disclosed |
| CN-115298192-A | 4' -O-methylene phosphonate nucleic acids and analogs thereof | 迪克纳制药公司 | 2022-11-04 | — | — | CN | disclosed |
| WO-2021127643-A1 | FLUOROALKYL-OXADIAZOLES AND USES THEREOF | TENAYA THERAPEUTICS, INC. (US) | 2021-06-24 | — | — | WO | disclosed |
| US-9587039-B2 | Fluorinated-containing macroinitiator and production process for the same | UNIMATEC CO., LTD. (JP) | 2017-03-07 | — | — | US | disclosed |
| EP-3088434-A1 | FLUORINE-CONTAINING DIBLOCK COPOLYMER | Unimatec Co., Ltd. (JP) | 2016-11-02 | — | — | EP | disclosed |
| EP-0996870-B1 | IMPROVED DISSOLUTION INHIBITION RESISTS FOR MICROLITHOGRAPHY | DU PONT (US) | 2004-03-24 | — | — | EP | disclosed |
| EP-0996870-A1 | IMPROVED DISSOLUTION INHIBITION RESISTS FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2000-05-03 | — | — | EP | disclosed |
| WO-1999004319-A1 | IMPROVED DISSOLUTION INHIBITION RESISTS FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-01-28 | — | — | WO | disclosed |
| US-5466496-A | Ferroelectric, improved response time and viewing angle, liquid crystalline acrylic ester polymer | SAMSUNG ELECTRON DEVICES CO., LTD. (KR) | 1995-11-14 | — | — | US | disclosed |