Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR2 | Q92731 | 1/20 | 0.44 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.43 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.42 |
| ▸ | CYP2B6 | P20813 | 1/20 | 0.42 |
| ▸ | SQOR | Q9Y6N5 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.41 |
| ▸ | TNKS2 | Q9H2K2 | 1/20 | 0.41 |
| ▸ | HPRT1 | P00492 | 1/20 | 0.40 |
| ▸ | BACE1 | P56817 | 1/20 | 0.39 |
| ▸ | PDCD1 | Q15116 | 1/20 | 0.38 |
| ▸ | CD274 | Q9NZQ7 | 1/20 | 0.38 |
| ▸ | TAAR1 | Q96RJ0 | 2/20 | 0.37 |
| ▸ | BRD4 | O60885 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6572863 | 1.00 | ESR2 (0.44) | ESR2PTGS1CYP2A6CYP2B6SQOR | |
| SCHEMBL9701631 | 1.00 | ESR2 (0.44) | ESR2PTGS1CYP2A6CYP2B6SQOR | |
| Biphenyl SCHEMBL18106197 | 0.98 | ESR2 (0.45) | ESR2PTGS1CYP2A6CYP2B6SQOR | |
| Biphenyl SCHEMBL27656465 | 0.98 | ESR2 (0.45) | ESR2PTGS1CYP2A6CYP2B6SQOR | |
| SCHEMBL128036 | 0.96 | ESR2 (0.47) | ESR2PTGS1CYP2A6CYP2B6SQOR | |
| Water SCHEMBL3331289 | 0.93 | ESR2 (0.45) | ESR2PTGS1CYP2A6CYP2B6SQOR | |
| SCHEMBL30954899 | 0.93 | ESR2 (0.45) | ESR2PTGS1CYP2A6CYP2B6SQOR | |
| SCHEMBL28805622 | 0.93 | ESR2 (0.45) | ESR2PTGS1CYP2A6CYP2B6SQOR | |
| Water SCHEMBL1538411 | 0.93 | ESR2 (0.45) | ESR2PTGS1CYP2A6CYP2B6SQOR | |
| Ammonia Solution, Strong SCHEMBL15862223 | 0.93 | ESR2 (0.45) | ESR2PTGS1CYP2A6CYP2B6SQOR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4262202-A | Scintillator detector array | GENERAL ELECTRIC COMPANY (US) | 1981-04-14 | — | — | US | claimed |
| CN-1208687-C | High-resolution photosnesiitve resin composition usable with I-line and method of forming patter | AZ ELECTRONIC MATERIALS JAPAN (JP) | 2005-06-29 | — | — | CN | disclosed |
| CN-1189694-C | Tiextile product with illuminated fibres, article made therefrom and production method of the same | LUMINICS S P A (IT) | 2005-02-16 | — | — | CN | disclosed |
| US-6806019-B2 | COATING SUBSTRATES WITH PHOTORESIST MIXTURES COMPRISING NOVOLAKS, ACRYLIC ESTER COPOLYMERS AND PHOTOSENSITIZERS, THEN EXPOSING THE COATINGS AND DEVELOPING, TO FORM SEMICONDUCTORS OR FLAT PANEL DISPLAYS | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-10-19 | — | — | US | disclosed |
| CN-1170204-C | Radiation-sensitive resin composition | �������ؽ��ڣ�BVI������˾ | 2004-10-06 | — | — | CN | disclosed |
| CN-1169021-C | Photosensitive resin composition and method of improving dry etching resistance of photosensitive resin composition | 克拉瑞特金融(BVI)有限公司 | 2004-09-29 | — | — | CN | disclosed |
| US-20040170917-A1 | Method of forming thick resist pattern | AZ ELECTRONIC MATERIALS USA CORP. | 2004-09-02 | — | — | US | disclosed |
| EP-1400850-A1 | METHOD OF FORMING THICK RESIST PATTERN | CLARIANT INTERNATIONAL LTD. (CH) | 2004-03-24 | — | — | EP | disclosed |
| CN-1446297-A | Tiextile product with illuminated fibres, article made therefrom and production method of the same | LUMINICS S P A (IT) | 2003-10-01 | — | — | CN | disclosed |
| EP-1345081-A1 | HIGH-RESOLUTION PHOTOSENSITIVE RESIN COMPOSITION USABLE WITH I-LINE AND METHOD OF FORMING PATTERN | Clariant International Ltd. (CH) | 2003-09-17 | — | — | EP | disclosed |
| US-6537719-B1 | Both a resin and a photosensitive material, wherein a fluorescent material is incorporated | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-03-25 | — | — | US | disclosed |
| CN-1401096-A | High resolution photosensitive resin composition for i-line and method of forming pattern | CLARIANT INT LTD (CH) | 2003-03-05 | — | — | CN | disclosed |
| US-20030022093-A1 | High-resolution photosensitive resin composition usable with i-line and method of forming pattern | AZ ELECTRONIC MATERIALS USA CORP. | 2003-01-30 | — | — | US | disclosed |
| CN-1313962-A | Photosensitive resin composition and method of improving dry etching resistance of photosensitive resin composition | CLARIANT INT LTD (CH) | 2001-09-19 | — | — | CN | disclosed |
| EP-1126319-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-08-22 | — | — | EP | disclosed |
| CN-1294703-A | Photosensitive resin compsn. | CLARIANT INT LTD (CH) | 2001-05-09 | — | — | CN | disclosed |
| EP-1087260-A1 | PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-03-28 | — | — | EP | disclosed |
| US-4262202-A | Scintillator detector array | GENERAL ELECTRIC COMPANY (US) | 1981-04-14 | — | — | US | disclosed |