Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.54 |
| ▸ | TSHR | P16473 | 1/20 | 0.54 |
| ▸ | ACHE | P22303 | 2/20 | 0.41 |
| ▸ | ESR1 | P03372 | 5/20 | 0.36 |
| ▸ | ESR2 | Q92731 | 5/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.36 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.36 |
| ▸ | TP53 | P04637 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | MGLL | Q99685 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | PSMD14 | O00487 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5880703 | 0.98 | ALDH1A1 (0.52) | ALDH1A1TSHRACHEESR1ESR2 | |
| SCHEMBL5880709 | 0.98 | ALDH1A1 (0.52) | ALDH1A1TSHRACHEESR1ESR2 | |
| SCHEMBL4956947 | 0.96 | ALDH1A1 (0.52) | ALDH1A1TSHRACHEPOLBKDM4E | |
| SCHEMBL5195131 | 0.92 | ALDH1A1 (0.50) | ALDH1A1TSHRACHEESR1ESR2 | |
| SCHEMBL5880675 | 0.89 | ALDH1A1 (0.43) | ALDH1A1TSHRACHEESR1ESR2 | |
| SCHEMBL14877347 | 0.89 | ALDH1A1 (0.62) | ALDH1A1TSHRESR1ESR2POLB | |
| SCHEMBL5599572 | 0.86 | ALDH1A1 (0.43) | ALDH1A1TSHRACHEESR1ESR2 | |
| SCHEMBL11577136 | 0.84 | ESR1 (0.51) | ALDH1A1TSHRACHEESR1ESR2 | |
| SCHEMBL15056 | 0.84 | ALDH1A1 (0.68) | ALDH1A1TSHRPOLBMAPTMAPK1 | |
| SCHEMBL2997715 | 0.84 | ALDH1A1 (0.68) | ALDH1A1TSHRPOLBMAPTMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210388226-A1 | DYE SUBLIMATION INKJET INK SET | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2021-12-16 | — | — | US | claimed |
| WO-2020162965-A1 | DYE SUBLIMATION INKJET INK SET | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2020-08-13 | — | — | WO | claimed |
| US-20210388226-A1 | DYE SUBLIMATION INKJET INK SET | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2021-12-16 | — | — | US | disclosed |
| WO-2020162965-A1 | DYE SUBLIMATION INKJET INK SET | HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P. (US) | 2020-08-13 | — | — | WO | disclosed |
| US-6806019-B2 | COATING SUBSTRATES WITH PHOTORESIST MIXTURES COMPRISING NOVOLAKS, ACRYLIC ESTER COPOLYMERS AND PHOTOSENSITIZERS, THEN EXPOSING THE COATINGS AND DEVELOPING, TO FORM SEMICONDUCTORS OR FLAT PANEL DISPLAYS | CLARIANT FINANCE (BVI) LIMITED (VG) | 2004-10-19 | — | — | US | disclosed |
| US-20040170917-A1 | Method of forming thick resist pattern | AZ ELECTRONIC MATERIALS USA CORP. | 2004-09-02 | — | — | US | disclosed |
| EP-1400850-A1 | METHOD OF FORMING THICK RESIST PATTERN | CLARIANT INTERNATIONAL LTD. (CH) | 2004-03-24 | — | — | EP | disclosed |
| EP-1345081-A1 | HIGH-RESOLUTION PHOTOSENSITIVE RESIN COMPOSITION USABLE WITH I-LINE AND METHOD OF FORMING PATTERN | Clariant International Ltd. (CH) | 2003-09-17 | — | — | EP | disclosed |
| US-6537719-B1 | Both a resin and a photosensitive material, wherein a fluorescent material is incorporated | CLARIANT FINANCE (BVI) LIMITED (VG) | 2003-03-25 | — | — | US | disclosed |
| US-20030022093-A1 | High-resolution photosensitive resin composition usable with i-line and method of forming pattern | AZ ELECTRONIC MATERIALS USA CORP. | 2003-01-30 | — | — | US | disclosed |
| EP-1126319-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-08-22 | — | — | EP | disclosed |
| EP-1087260-A1 | PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-03-28 | — | — | EP | disclosed |
| WO-2001017784-A1 | GENUINE PRINTING REFILL AND METHOD | INKSURE LTD. (IL) | 2001-03-15 | — | — | WO | disclosed |