SCHEMBL6565000

SCHEMBL6565000

NC1CCCCCC1(N)C1(N)CCCCCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL732438 0.86
SCHEMBL1155589 0.85 THRB (0.35)
SCHEMBL8075382 0.82 THRB (0.33)
SCHEMBL3117908 0.81
SCHEMBL9127956 0.73
SCHEMBL23358846 0.72 THRB (0.33)
SCHEMBL23358944 0.72 THRB (0.33)
SCHEMBL23358999 0.72 THRB (0.33)
SCHEMBL6229375 0.72 THRB (0.33)
SCHEMBL1518712 0.72 THRB (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10053536-B2 Antistatic resin composition, and container and packaging material which use same ADEKA CORPORATION (JP) 2018-08-21 US disclosed
US-20170349703-A1 ANTISTATIC RESIN COMPOSITION, AND CONTAINER AND PACKAGING MATERIAL WHICH USE SAME ADEKA CORPORATION (JP) 2017-12-07 US disclosed
EP-3249018-A1 ANTISTATIC RESIN COMPOSITION, AND CONTAINER AND PACKAGING MATERIAL WHICH USE SAME Adeka Corporation (JP) 2017-11-29 EP disclosed
US-20040191672-A1 Resist composition MITSUBISHI GAS CHEMICAL CO., LTD. (JP) 2004-09-30 US disclosed
EP-1443362-A2 Resist composition MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-08-04 EP disclosed